SCHEMBL9636124

SCHEMBL9636124

Brc1ccc2[nH]nnc2c1.[Ag]

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOS1 P29475 2/20 0.42
METAP2 P50579 2/20 0.42
CSNK2A1 P68400 2/20 0.42
JAK2 O60674 3/20 0.41
PDPK1 O15530 3/20 0.41
DYRK1A Q13627 3/20 0.38
PABPC1 P11940 1/20 0.37
PRKD3 O94806 2/20 0.37
MAP4K4 O95819 2/20 0.37
CSF1R P07333 2/20 0.37
FLT3 P36888 2/20 0.37
CLK2 P49760 2/20 0.37
MAP4K2 Q12851 2/20 0.37
NTRK3 Q16288 2/20 0.37
AURKB Q96GD4 2/20 0.37
CLK4 Q9HAZ1 2/20 0.37
DCLK1 O15075 1/20 0.37
CHEK2 O96017 1/20 0.37
FER P16591 1/20 0.37
CDK2 P24941 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL204484 0.98 NOS1 (0.44) NOS1METAP2CSNK2A1JAK2PDPK1
SCHEMBL4104023 0.81 METAP2 (0.44) NOS1METAP2CSNK2A1JAK2PDPK1
SCHEMBL31125272 0.81 METAP2 (0.44) NOS1METAP2CSNK2A1JAK2PDPK1
SCHEMBL19640293 0.76 CLK1 (0.34) JAK2DYRK1ACLK2CLK4PIM1
SCHEMBL6365002 0.75 CYP1A2 (0.38) CYP1A2CYP2C19HTTCHEK1PIM1
SCHEMBL8421908 0.75 DYRK1A (0.47) CSNK2A1DYRK1ACYP2A6HTTKDR
SCHEMBL9171831 0.75 ALDH1A1 (0.47) PDPK1FLT3ABL1PDGFRBPDGFRA
SCHEMBL1150908 0.75 F7 (0.47) NOS1DYRK1AAHRNR4A2BACE1
SCHEMBL23348984 0.74 CLK1 (0.37) JAK2PDPK1DYRK1ACLK2CLK4
SCHEMBL171634 0.72 NOS1 (0.44) NOS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0256820-B1 THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1992-07-29 EP disclosed
US-5032499-A High density, stability KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1991-07-16 US disclosed
EP-0256820-A2 Thermal developing light-sensitive material KONICA CORPORATION (JP) 1988-02-24 EP disclosed