SCHEMBL204484

SCHEMBL204484

Brc1ccc2[nH]nnc2c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOS1 P29475 2/20 0.44
METAP2 P50579 2/20 0.44
CSNK2A1 P68400 2/20 0.44
JAK2 O60674 3/20 0.42
PDPK1 O15530 3/20 0.42
DYRK1A Q13627 3/20 0.39
PABPC1 P11940 1/20 0.38
PRKD3 O94806 2/20 0.38
MAP4K4 O95819 2/20 0.38
CSF1R P07333 2/20 0.38
FLT3 P36888 2/20 0.38
CLK2 P49760 2/20 0.38
MAP4K2 Q12851 2/20 0.38
NTRK3 Q16288 2/20 0.38
AURKB Q96GD4 2/20 0.38
CLK4 Q9HAZ1 2/20 0.38
DCLK1 O15075 1/20 0.38
CHEK2 O96017 1/20 0.38
FER P16591 1/20 0.38
CDK2 P24941 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9636124 0.98 NOS1 (0.42) NOS1METAP2CSNK2A1JAK2PDPK1
SCHEMBL4104023 0.83 METAP2 (0.44) NOS1METAP2CSNK2A1JAK2PDPK1
SCHEMBL31125272 0.83 METAP2 (0.44) NOS1METAP2CSNK2A1JAK2PDPK1
SCHEMBL19640293 0.77 CLK1 (0.34) JAK2DYRK1ACLK2CLK4PIM1
SCHEMBL23348984 0.76 CLK1 (0.37) JAK2PDPK1DYRK1ACLK2CLK4
SCHEMBL171634 0.74 NOS1 (0.44) NOS1
SCHEMBL242787 0.74 ALDH1A1 (0.48) PDPK1FLT3ABL1PDGFRBPDGFRA
SCHEMBL1156044 0.74
SCHEMBL103404 0.74 METAP2 (0.38) METAP2PDPK1AHRCYP1A2CYP2C19
SCHEMBL103309 0.74 CYP1A2 (0.39) NOS1CYP1A2HTTCHEK1PIM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 761 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122061184-A Gas diffusion electrode and method for producing same 香港城市大学深圳研究院 2026-05-19 CN claimed
US-12590224-B2 Chemical mechanical polishing compositions and methods of use thereof FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2026-03-31 US claimed
EP-4647474-A2 CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM Electronic Materials U.S.A., Inc. (US) 2025-11-12 EP claimed
EP-3774680-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2025-09-24 EP claimed
US-12187984-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2025-01-07 US claimed
CN-119220351-A Application of cleaning liquid 上海新阳半导体材料股份有限公司 2024-12-31 CN claimed
CN-119220352-A Preparation method of cleaning liquid 上海新阳半导体材料股份有限公司 2024-12-31 CN claimed
US-12139693-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2024-11-12 US claimed
EP-3672944-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2024-08-07 EP claimed
US-20240174924-A1 ETCHING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-05-30 US claimed
US-20150111804-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-04-23 US claimed
CN-104419326-A Slurry composition for chemical mechanical polishing COWON INNOTECH INC 2015-03-18 CN claimed
CN-103923765-A Detergent Composition For Process Of Manufacturing Semiconductors And Displays COWON INNOTECH INC 2014-07-16 CN claimed
EP-1403698-B1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJIFILM CORP (JP) 2008-09-03 EP claimed
US-7037641-B2 Silver halide emulsion sheet for detecting track of charged elementary particles, and processing method thereof FUJI PHOTO FILM CO.,LTD. (JP) 2006-05-02 US claimed
US-20050233267-A1 Silver halide emulsion sheet for detecting track of charged elementary particles, and processing method thereof FUJIFILM CORPORATION (JP) 2005-10-20 US claimed
US-6916600-B2 Silver halide emulsion sheet for detecting track of charged elementary particles, and processing method thereof FUJI PHOTO FILM CO., LTD. (JP) 2005-07-12 US claimed
US-20030096203-A1 Silver halide emulsion sheet for detecting track of charged elementary particles, and processing method thereof FUJIFILM CORPORATION (JP) 2003-05-22 US claimed
US-4299670-A WHERE SURFACE IS EXPOSED TO A BENZOTRIAZOLE COMPOUND BELL TELEPHONE LABORATORIES, INCORPORATED (US) 1981-11-10 US claimed
US-4105656-A PROCESS FOR PREPARING 3-N-MONOSUBSTITUTED AMINO-4-SUBSTITUTED-5-PYRAZOLONES FUJI PHOTO FILM CO., LTD. (JP) 1978-08-08 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12590224-B2 Chemical mechanical polishing compositions and methods of use thereof PHOSPHO1, ACP1, PLEC NOS1 1429/4885METAP2 1093/4885CSNK2A1 50/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.