SCHEMBL9637280

SCHEMBL9637280

CCOc1ccc2c(c1)nnn2[Ag]

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.51
HSD17B10 Q99714 4/20 0.46
KDM4E B2RXH2 2/20 0.46
HTT P42858 1/20 0.46
CTNNB1 P35222 1/20 0.43
KMT2A Q03164 2/20 0.42
MEN1 O00255 1/20 0.42
ACSS2 Q9NR19 1/20 0.41
ALDH1A1 P00352 4/20 0.41
HPGD P15428 3/20 0.41
NQO1 P15559 1/20 0.41
ESR2 Q92731 1/20 0.38
POLB P06746 1/20 0.38
TP53 P04637 2/20 0.38
TSHR P16473 2/20 0.38
CYP3A4 P08684 1/20 0.38
NPC1 O15118 1/20 0.38
USP2 O75604 1/20 0.38
LMNA P02545 1/20 0.38
NFKB1 P19838 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9321964 0.81 TDP1 (0.44) MAPTHSD17B10KDM4EHTTKMT2A
SCHEMBL11597638 0.74 HCAR3 (0.50) MAPTHSD17B10KDM4EHTT
SCHEMBL6743405 0.72 KCNMA1 (0.44) MAPTKMT2AMEN1ALDH1A1POLB
SCHEMBL6765781 0.70 CTNNB1 (0.41) CTNNB1TSHRLMNA
SCHEMBL10348181 0.68 ALDH1A1 (0.41) KDM4ECTNNB1KMT2AMEN1ALDH1A1
SCHEMBL1150909 0.68 CHEK1 (0.50) KDM4EKMT2AMEN1NPC1RAB9A
SCHEMBL9636128 0.68 PABPC1 (0.36) MAPTHSD17B10KDM4EHTTALDH1A1
SCHEMBL7812496 0.68 MAPT (0.55) MAPTHSD17B10KDM4EHTTKMT2A
SCHEMBL6546427 0.67 ALDH1A1 (0.47) MAPTHSD17B10KDM4EHTTKMT2A
SCHEMBL5470441 0.67 MAPT (0.70) MAPTHSD17B10KDM4EHTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0256820-B1 THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1992-07-29 EP disclosed
US-5032499-A High density, stability KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1991-07-16 US disclosed
EP-0256820-A2 Thermal developing light-sensitive material KONICA CORPORATION (JP) 1988-02-24 EP disclosed