Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.44 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.44 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | TP53 | P04637 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | ACHE | P22303 | 4/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL565108 | 0.98 | KDM4E (0.58) | KDM4EALDH1A1TDP1APOBEC3AAPOBEC3G | |
| Hydrochloric Acid SCHEMBL28191207 | 0.95 | KDM4E (0.56) | KDM4EALDH1A1TDP1APOBEC3AAPOBEC3G | |
| Ammonia Solution, Strong SCHEMBL28850907 | 0.95 | KDM4E (0.56) | KDM4EALDH1A1TDP1APOBEC3AAPOBEC3G | |
| Fluoride SCHEMBL28344247 | 0.95 | KDM4E (0.56) | KDM4EALDH1A1TDP1APOBEC3AAPOBEC3G | |
| Hydrochloric Acid SCHEMBL1559083 | 0.95 | KDM4E (0.62) | KDM4EALDH1A1TDP1APOBEC3AAPOBEC3G | |
| Bromide SCHEMBL6122965 | 0.95 | KDM4E (0.56) | KDM4EALDH1A1TDP1APOBEC3AAPOBEC3G | |
| Water SCHEMBL28001864 | 0.95 | KDM4E (0.56) | KDM4EALDH1A1TDP1APOBEC3AAPOBEC3G | |
| SCHEMBL21747552 | 0.95 | KDM4E (0.56) | KDM4EALDH1A1TDP1APOBEC3AAPOBEC3G | |
| Iodide SCHEMBL22188504 | 0.95 | KDM4E (0.56) | KDM4EALDH1A1TDP1APOBEC3AAPOBEC3G | |
| SCHEMBL11424983 | 0.93 | KDM4E (0.54) | KDM4EALDH1A1TDP1APOBEC3AAPOBEC3G |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| CN-112286000-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-111856882-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| US-20240319598-A1 | Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-26 | — | — | US | disclosed |
| EP-4435515-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-25 | — | — | EP | disclosed |
| CN-118620392-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-09-10 | — | — | CN | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| EP-3680275-B1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-03-06 | — | — | EP | disclosed |
| US-20230305405-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20200216670-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |
| CN-111208710-A | Iodine-containing thermosetting silicon-containing material, resist underlayer film-forming composition for extreme ultraviolet lithography containing the same, and pattern formation method | 信越化学工业株式会社 | 2020-05-29 | — | — | CN | disclosed |
| US-5128164-A | Sweeteners for foods and beverages | SOUTH AFRICAN INVENTIONS DEVELOPMENT CORPORATION (ZA) | 1992-07-07 | — | — | US | disclosed |
| US-4975298-A | Sweetners for foods and beverages | SOUTH AFRICAN INVENTIONS DEVELOPMENT CORPORATION (ZA) | 1990-12-04 | — | — | US | disclosed |
| EP-0137426-A2 | 2-Mercaptothiazole derivatives, process for their preparation and utilization of 2-mercaptothiazole derivatives in pharmaceutical compounds | BAYER AG (DE) | 1985-04-17 | — | — | EP | disclosed |
| US-4286037-A | Electrostatic image one-component electrically conductive thermoplastic resin containing powdered developer prepared by coagulation in emulsion | OCE-VAN DER GRINTEN N.V. (NL) | 1981-08-25 | — | — | US | disclosed |
| EP-0002734-B1 | PROCESS FOR THE PREPARATION OF PIPERONYLIDENECROTON AMIDES | HAARMANN & REIMER GMBH (DE) | 1980-09-17 | — | — | EP | disclosed |
| US-4209643-A | Preparation of acetals | ETHYL CORPORATION (US) | 1980-06-24 | — | — | US | disclosed |
| US-4209445-A | FROM PIPERONAL AND A CROTONIC AMIDE IN PRESENCE OF QUATERNARY AMMONIUM OR PHOSPHONIUM HYDROXIDE OR CROWN ETHER METAL COMPLEX | HAARMAN & REIMER GMBH (DE) | 1980-06-24 | — | — | US | disclosed |
| US-4146494-A | One-component developer powder and process for its preparation | OCE-VAN DE GRINTEN N.V. (NL) | 1979-03-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SMC1A, CDH1, SMC4 | KDM4E 404/4885ALDH1A1 1586/4885TDP1 787/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | KDM4E 588/4885ALDH1A1 4452/4885TDP1 3556/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.