Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR2 | Q92731 | 3/20 | 0.59 |
| ▸ | ESR1 | P03372 | 2/20 | 0.59 |
| ▸ | BACE1 | P56817 | 2/20 | 0.50 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.46 |
| ▸ | PELI1 | Q96FA3 | 1/20 | 0.45 |
| ▸ | HSD17B2 | P37059 | 2/20 | 0.44 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | USP2 | O75604 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23861365 | 1.00 | ESR2 (0.59) | ESR2ESR1BACE1ALOX5PELI1 | |
| SCHEMBL23861344 | 0.96 | ESR2 (0.62) | ESR2ESR1BACE1ALOX5PELI1 | |
| SCHEMBL12005093 | 0.95 | ESR2 (0.58) | ESR2ESR1BACE1ALOX5PELI1 | |
| SCHEMBL30174968 | 0.95 | ESR1 (0.66) | ESR2ESR1BACE1ALOX5PELI1 | |
| SCHEMBL835714 | 0.95 | ESR1 (0.66) | ESR2ESR1BACE1ALOX5PELI1 | |
| SCHEMBL22317286 | 0.92 | ESR2 (0.61) | ESR2ESR1BACE1ALOX5PELI1 | |
| SCHEMBL23082044 | 0.90 | ESR2 (0.56) | ESR2ESR1BACE1ALOX5HSD17B2 | |
| SCHEMBL9817111 | 0.90 | ESR2 (0.60) | ESR2ESR1BACE1ALOX5PELI1 | |
| SCHEMBL9713254 | 0.89 | ESR2 (0.54) | ESR2ESR1BACE1ALOX5PELI1 | |
| SCHEMBL23861362 | 0.86 | ESR2 (0.54) | ESR2ESR1ALOX5HSD17B2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11130724-B2 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-09-28 | — | — | US | disclosed |
| US-11067889-B2 | Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-07-20 | — | — | US | disclosed |
| US-20210070727-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210070685-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210070683-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210047457-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-18 | — | — | US | disclosed |
| US-20210040290-A1 | COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-11 | — | — | US | disclosed |
| EP-3747954-A1 | COMPOSITION, RESIST-PATTERN FORMING METHOD, AND INSULATING-FILM FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-09 | — | — | EP | disclosed |
| EP-3744710-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-02 | — | — | EP | disclosed |
| US-10550068-B2 | Compound and method for producing same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-02-04 | — | — | US | disclosed |
| WO-2019142897-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | 三菱瓦斯化学株式会社 | 2019-07-25 | — | — | WO | disclosed |
| US-20180201570-A1 | NOVEL COMPOUND AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-07-19 | — | — | US | disclosed |
| US-20180201570-A1 | NOVEL COMPOUND AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-07-19 | — | — | US | disclosed |
| EP-3327505-A1 | NOVEL COMPOUND AND METHOD FOR PRODUCING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-05-30 | — | — | EP | disclosed |
| WO-2018016640-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2018-01-25 | — | — | WO | disclosed |
| WO-2018016615-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2018-01-25 | — | — | WO | disclosed |
| US-5151531-A | DIHYDRIC PHENOLS | IDEMITSU KOSAN CO., LTD. (JP) | 1992-09-29 | — | — | US | disclosed |
| EP-0249963-B1 | POLYCARBONATES | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-4892924-A | Polycarbonate containing compound from bis(3-phenyl-4-hydroxyphenyl) | IDEMITSU KOSAN CO., LTD. (JP) | 1990-01-09 | — | — | US | disclosed |
| EP-0249963-A2 | Polycarbonates | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1987-12-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210070683-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | RER1, RTN4, FEM1B | ESR2 2068/4885ESR1 1539/4885BACE1 2882/4885 |
| US-20210070727-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | RDX, RTN4, CROCC | ESR2 1492/4885ESR1 1453/4885BACE1 1791/4885 |
| US-11067889-B2 | Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method | C5, C9, PRMT9 | ESR2 1941/4885ESR1 1606/4885BACE1 1846/4885 |
| US-20210070685-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | RER1, RTN4, FEM1B | ESR2 2068/4885ESR1 1539/4885BACE1 2882/4885 |
| US-10550068-B2 | Compound and method for producing same | C5, CBR1, MTR | ESR2 1841/4885ESR1 2037/4885BACE1 2047/4885 |
| US-20180201570-A1 | NOVEL COMPOUND AND METHOD FOR PRODUCING SAME | C5, CBR3, CBR1 | ESR2 1690/4885ESR1 2141/4885BACE1 2357/4885 |
| US-11130724-B2 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | RER1, NBAS, INTS9 | ESR2 1033/4885ESR1 713/4885BACE1 3146/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.