SCHEMBL9742294

SCHEMBL9742294

COc1ccc(O)c(O)c1O

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.65
MAPT P10636 3/20 0.65
MAPK1 P28482 3/20 0.65
HSD17B10 Q99714 3/20 0.65
ALDH1A1 P00352 3/20 0.65
TP53 P04637 2/20 0.65
LMNA P02545 2/20 0.65
CYP3A4 P08684 2/20 0.65
HPGD P15428 2/20 0.65
ALOX15 P16050 2/20 0.65
ALOX12 P18054 1/20 0.65
HIF1A Q16665 1/20 0.59
EPAS1 Q99814 1/20 0.59
MAOB P27338 1/20 0.50
TSHR P16473 2/20 0.48
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
TDP1 Q9NUW8 2/20 0.46
RECQL P46063 1/20 0.46
ERN1 O75460 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL69957 0.89 MAPT (0.62) KDM4EMAPTMAPK1HSD17B10ALDH1A1
SCHEMBL9639006 0.84 MAPT (0.65) KDM4EMAPTMAPK1HSD17B10ALDH1A1
SCHEMBL5349727 0.80 CYP3A4 (0.54) KDM4EMAPTMAPK1HSD17B10ALDH1A1
SCHEMBL7861678 0.80 HIF1A (0.55) KDM4EMAPTMAPK1HSD17B10ALDH1A1
SCHEMBL1608046 0.80 ALDH1A1 (0.54) KDM4EMAPTMAPK1HSD17B10ALDH1A1
SCHEMBL70595 0.80 MAPT (0.57) KDM4EMAPTMAPK1HSD17B10ALDH1A1
Methoxymethane SCHEMBL28772216 0.80 ALDH1A1 (0.50) KDM4EMAPTMAPK1HSD17B10ALDH1A1
3-Methoxycatechol SCHEMBL67332 0.79 TP53 (1.00) KDM4EMAPTMAPK1HSD17B10ALDH1A1
3-Methoxycatechol SCHEMBL29477155 0.79 TP53 (1.00) KDM4EMAPTMAPK1HSD17B10ALDH1A1
SCHEMBL5469559 0.78 MAPK1 (0.52) KDM4EMAPTMAPK1HSD17B10ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105527803-B Photoresist cleaning solution 安集微电子(上海)有限公司 2020-08-18 CN claimed
CN-105527803-A Photoresist cleaning fluid ANJI MICROELECTRONICS (SHANGHAI) CO LTD 2016-04-27 CN claimed
CN-102872064-B Seed of Fructus Lycii and extract method extracting alpha-glucosidase activity inhibitor and uses thereof in the residue after Lycium-seed-oil NINGXIA HUI AUTONOMOUS PREFECTURE INSTITUTE FOR DRUG CONTROL (CN) 2015-08-19 CN claimed
CN-102872064-A Method for extracting alpha-glucosidase activity inhibitor from lycium barbarum seeds and residues after extraction of lycium barbarum oil from lycium barbarum seeds and application thereof NINGXIA INST FOR DRUG CONTROL 2013-01-16 CN claimed
CN-101316893-A Formaldehyde-free phenolic resin binder SAINT GOBAIN ISOVER (FR) 2008-12-03 CN claimed
CN-105527803-B Photoresist cleaning solution 安集微电子(上海)有限公司 2020-08-18 CN disclosed
CN-109238801-A A kind of blood cell analysis hemolytic agent 武汉百合龙腾生物科技有限责任公司 2019-01-18 CN disclosed
CN-105527803-A Photoresist cleaning fluid ANJI MICROELECTRONICS (SHANGHAI) CO LTD 2016-04-27 CN disclosed
CN-102872064-B Seed of Fructus Lycii and extract method extracting alpha-glucosidase activity inhibitor and uses thereof in the residue after Lycium-seed-oil NINGXIA HUI AUTONOMOUS PREFECTURE INSTITUTE FOR DRUG CONTROL (CN) 2015-08-19 CN disclosed
CN-101316893-B Formaldehyde-free phenolic resin binder SAINT GOBAIN ISOVER 2013-03-13 CN disclosed
CN-102872064-A Method for extracting alpha-glucosidase activity inhibitor from lycium barbarum seeds and residues after extraction of lycium barbarum oil from lycium barbarum seeds and application thereof NINGXIA INST FOR DRUG CONTROL 2013-01-16 CN disclosed
EP-1537116-B1 PYRAZOLOPYRIMIDINES SUITABLE FOR THE TREATMENT OF CANCER DISEASES SCHERING CORP (US) 2010-06-02 EP disclosed
CN-101316893-A Formaldehyde-free phenolic resin binder SAINT GOBAIN ISOVER (FR) 2008-12-03 CN disclosed
US-5087548-A POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., INC. (JP) 1992-02-11 US disclosed
US-4842983-A PHENOLIC RESOLE MIXED WITH LIGHT SENSITIVE SUBSTANCE OR REACTED WITH QUINONE DIAZIDE SULFONYL HALIDE FUJI PHOTO FILM CO., LTD. (JP) 1989-06-27 US disclosed
US-4732840-A LITHOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 1988-03-22 US disclosed
EP-0227487-A2 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-07-01 EP disclosed
EP-0196031-A2 Light-sensitive compositions and light-sensitive materials FUJI PHOTO FILM CO., LTD. (JP) 1986-10-01 EP disclosed