SCHEMBL976731

SCHEMBL976731

CCCCN(OCO)OCO

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.36
SMN1; SMN2 Q16637 1/20 0.35
CA12 O43570 3/20 0.34
CA1 P00915 3/20 0.34
CA9 Q16790 3/20 0.34
ALDH2 P05091 1/20 0.34
LMNA P02545 3/20 0.33
TSHR P16473 3/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
HSD17B10 Q99714 1/20 0.33
MMP1 P03956 1/20 0.32
MMP2 P08253 1/20 0.32
MMP3 P08254 1/20 0.32
MMP8 P22894 1/20 0.32
CA2 P00918 1/20 0.32
DNM1 Q05193 1/20 0.31
THRB P10828 1/20 0.30
HTT P42858 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4936003 0.92 DNM1 (0.40) ALDH1A1SMN1; SMN2CA12CA1CA9
SCHEMBL9580791 0.90 DNM1 (0.44) ALDH1A1SMN1; SMN2CA12CA1CA9
SCHEMBL9580815 0.90 DNM1 (0.44) ALDH1A1SMN1; SMN2CA12CA1CA9
SCHEMBL9580808 0.90 DNM1 (0.44) ALDH1A1SMN1; SMN2CA12CA1CA9
SCHEMBL977300 0.83 CA12 (0.32) CA12CA1CA9CA2
SCHEMBL43803 0.80 TSHR (0.46) ALDH1A1SMN1; SMN2CA12CA1CA9
Bromide SCHEMBL1835574 0.78 TSHR (0.44) ALDH1A1SMN1; SMN2CA12CA1CA9
Hydrochloric Acid SCHEMBL1132203 0.78 TSHR (0.44) ALDH1A1SMN1; SMN2CA12CA1CA9
SCHEMBL522381 0.78 ALDH1A1 (0.43) ALDH1A1SMN1; SMN2CA12CA1CA9
Ammonia Solution, Strong SCHEMBL2637823 0.78 TSHR (0.44) ALDH1A1SMN1; SMN2CA12CA1CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105153905-B A kind of preparation method and applications of graphene modified polyurethane film forming agent 泰山玻璃纤维有限公司 2017-12-01 CN claimed
US-20080066644-A1 Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-20 US claimed
EP-1900785-A1 Ink Composition for Inkjet Recording Samsung Electronics Co., Ltd. (KR) 2008-03-19 EP claimed
EP-3518874-B1 METHODS, COMPOSITIONS AND USES RELATING THERETO INNOSPEC LTD (GB) 2023-08-16 EP disclosed
WO-2023131780-A1 CORROSION INHIBITOR INNOSPEC LIMITED (GB) 2023-07-13 WO disclosed
US-11311471-B2 Methods, compositions and uses relating thereto INNOSPEC LIMITED (GB) 2022-04-26 US disclosed
US-11253453-B2 Reducing colour loss from a dyed material by using an amine salt of a carboxylic acid INNOSPEC LIMITED (GB) 2022-02-22 US disclosed
US-11234917-B2 Methods, compositions and uses relating thereto INNOSPEC LIMITED (GB) 2022-02-01 US disclosed
EP-3518873-B1 METHODS, COMPOSITIONS AND USES RELATING THERETO INNOSPEC LTD (GB) 2022-01-05 EP disclosed
CN-105676601-B Pretreatment method of glass substrate for forming etching mask 东京应化工业株式会社 2020-08-07 CN disclosed
CN-106795087-B Quaternary ammonium compounds and their use as fuel or lubricant additives 因诺斯佩克有限公司 2020-07-14 CN disclosed
US-20020086167-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2002-07-04 US disclosed
US-6413647-B1 USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH JSR CORPORATION (JP) 2002-07-02 US disclosed
US-6410150-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-6410151-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-20010018129-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2001-08-30 US disclosed
EP-1127929-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-08-29 EP disclosed
EP-1122770-A2 Silica-based insulating film and its manufacture JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1090967-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-11 EP disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11311471-B2 Methods, compositions and uses relating thereto LPO, AOC1, HAO2 ALDH1A1 163/4885SMN1; SMN2 1324/4885CA12 37/4885
US-11234917-B2 Methods, compositions and uses relating thereto LPO, CA7, AOX1 ALDH1A1 120/4885SMN1; SMN2 804/4885CA12 36/4885
US-11253453-B2 Reducing colour loss from a dyed material by using an amine salt of a carboxylic acid CA9, CA12, CA7 ALDH1A1 441/4885SMN1; SMN2 303/4885CA12 2/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.