SCHEMBL9818635

SCHEMBL9818635

Cc1cc(NC(C(=O)OC(C)C)C(=O)OC(C)C)ccc1C=O

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.51
CA1 P00915 3/20 0.51
CA2 P00918 3/20 0.51
CA9 Q16790 3/20 0.51
KDM4E B2RXH2 2/20 0.44
TYR P14679 1/20 0.36
TSHR P16473 2/20 0.36
RECQL P46063 1/20 0.36
NPC1 O15118 5/20 0.34
RAB9A P51151 5/20 0.34
HPGD P15428 2/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
TUBB4A P04350 1/20 0.33
TUBB P07437 1/20 0.33
TUBA3C P0DPH7 1/20 0.33
TUBA1B P68363 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8096813 0.78 ALDH1A1 (0.41) KDM4ETYRTSHRRECQLNPC1
SCHEMBL1248412 0.71 RAB9A (0.54) KDM4ETSHRNPC1RAB9AHPGD
SCHEMBL377917 0.70 ALDH1A1 (0.54) CA12CA1CA2CA9KDM4E
SCHEMBL29958034 0.70 ALDH1A1 (0.54) CA12CA1CA2CA9KDM4E
SCHEMBL9513873 0.70 TYR (0.34) KDM4ETYRTSHRNPC1RAB9A
SCHEMBL20564729 0.70 CA2 (0.50) CA12CA1CA2CA9NPC1
SCHEMBL2766868 0.69 ALDH1A1 (0.45) KDM4ETYRTSHRNPC1RAB9A
SCHEMBL3725560 0.68 ALDH1A3 (0.53) KDM4ETYRTSHRNPC1RAB9A
SCHEMBL9944328 0.68 RAB9A (0.43) KDM4ENPC1RAB9ASMN1; SMN2ALDH1A1
SCHEMBL9944283 0.68 PLAU (0.47) KDM4ENPC1RAB9ASMN1; SMN2NFKB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0231522-B1 ANTIREFLECTIVE PHOTORESIST COMPOSITION EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1991-12-04 EP disclosed
EP-0231522-A2 Antireflective photoresist composition EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-08-12 EP disclosed