Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.37 |
| ▸ | TSHR | P16473 | 4/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | TERT | O14746 | 1/20 | 0.35 |
| ▸ | APP | P05067 | 1/20 | 0.35 |
| ▸ | APAF1 | O14727 | 1/20 | 0.34 |
| ▸ | CRHR1 | P34998 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL10936946 | 0.96 | MAPT (0.41) | MAPTALDH1A1TSHRALOX15HSD17B10 | |
| Hydrochloric Acid SCHEMBL9803396 | 0.96 | MAPT (0.41) | MAPTALDH1A1TSHRALOX15HSD17B10 | |
| SCHEMBL10934891 | 0.96 | MAPT (0.43) | MAPTALDH1A1TSHRALOX15HSD17B10 | |
| Hydrochloric Acid SCHEMBL9859685 | 0.94 | MAPT (0.40) | MAPTALDH1A1TSHRALOX15HSD17B10 | |
| Hydrochloric Acid SCHEMBL9803975 | 0.80 | S100B (0.51) | MAPTALDH1A1TSHRALOX15HSD17B10 | |
| Hydrochloric Acid SCHEMBL11875836 | 0.78 | S100B (0.53) | MAPTALDH1A1TSHRALOX15HSD17B10 | |
| Hydrochloric Acid SCHEMBL9803384 | 0.77 | NQO2 (0.39) | MAPTALDH1A1TSHRHSD17B10APP | |
| SCHEMBL11061844 | 0.76 | S100B (0.55) | MAPTALDH1A1TSHRALOX15HSD17B10 | |
| SCHEMBL14566989 | 0.75 | CRHR1 (0.32) | MAPTAPPCRHR1 | |
| Hydrochloric Acid SCHEMBL9859101 | 0.75 | S100B (0.50) | MAPTALDH1A1TSHRALOX15HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4510226-A | Photosensitive composition and pattern forming process using same | HITACHI, LTD. (JP) | 1985-04-09 | — | — | US | claimed |
| EP-0042704-B1 | METHOD OF FORMING A PATTERN EMPLOYING A PHOTOSENSITIVE COMPOSITION | Hitachi, Ltd. (JP) | 1985-03-20 | — | — | EP | claimed |
| US-4377630-A | COMPRISING AN AROMATIC DIAZONIUM SALT AND N,N-DIALKYL ANILINE SALT | HITACHI, LTD. (JP) | 1983-03-22 | — | — | US | claimed |
| US-4983500-A | Resolution, contrast | HITACHI, LTD. (JP) | 1991-01-08 | — | — | US | disclosed |
| EP-0100920-B1 | PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING PROCESS USING SAME | HITACHI, LTD. (JP) | 1986-07-16 | — | — | EP | disclosed |
| EP-0043716-B1 | PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING PROCESS USING SAME | Hitachi, Ltd. (JP) | 1985-04-10 | — | — | EP | disclosed |
| US-4510226-A | Photosensitive composition and pattern forming process using same | HITACHI, LTD. (JP) | 1985-04-09 | — | — | US | disclosed |
| EP-0042704-B1 | METHOD OF FORMING A PATTERN EMPLOYING A PHOTOSENSITIVE COMPOSITION | Hitachi, Ltd. (JP) | 1985-03-20 | — | — | EP | disclosed |
| EP-0100920-A1 | Photosensitive composition and pattern forming process using same | HITACHI, LTD. (JP) | 1984-02-22 | — | — | EP | disclosed |
| US-4409313-A | Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine | HITACHI, LTD. (JP) | 1983-10-11 | — | — | US | disclosed |
| US-4377630-A | COMPRISING AN AROMATIC DIAZONIUM SALT AND N,N-DIALKYL ANILINE SALT | HITACHI, LTD. (JP) | 1983-03-22 | — | — | US | disclosed |
| EP-0043716-A2 | Photosensitive composition and pattern forming process using same | Hitachi, Ltd. (JP) | 1982-01-13 | — | — | EP | disclosed |
| EP-0042704-A2 | Method of forming a pattern employing a photosensitive composition | Hitachi, Ltd. (JP) | 1981-12-30 | — | — | EP | disclosed |