SCHEMBL987760

SCHEMBL987760

O=[N+]([O-])c1ccc2c(c1)Cc1cc([N+](=O)[O-])ccc1-2

nearest known ligand 0.79

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TLR9 Q9NR96 2/20 0.79
MEN1 O00255 2/20 0.79
MAPT P10636 2/20 0.79
KMT2A Q03164 2/20 0.79
LMNA P02545 2/20 0.79
RAB9A P51151 1/20 0.79
TDP2 O95551 1/20 0.64
HSP90AA1 P07900 1/20 0.58
CRHBP P24387 1/20 0.57
CRHR2 Q13324 1/20 0.57
PGR P06401 2/20 0.56
PTPRC P08575 3/20 0.55
S100A4 P26447 2/20 0.55
PNMT P11086 4/20 0.53
ADRA2A P08913 2/20 0.53
PARP1 P09874 1/20 0.51
CYP1A2 P05177 1/20 0.50
ALDH1A1 P00352 1/20 0.50
CYP3A4 P08684 1/20 0.50
TDP1 Q9NUW8 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30049268 1.00 TLR9 (0.79) TLR9MEN1MAPTKMT2ALMNA
2-Nitrofluorene SCHEMBL29450702 0.91 MAPT (0.68) TLR9MEN1MAPTKMT2ALMNA
2-Nitrofluorene SCHEMBL644332 0.91 MAPT (0.68) TLR9MEN1MAPTKMT2ALMNA
SCHEMBL8927848 0.89 TLR9 (0.66) TLR9MEN1MAPTKMT2ALMNA
SCHEMBL2374341 0.89 MAPT (1.00) TLR9MEN1MAPTKMT2ALMNA
SCHEMBL5030144 0.89 TLR9 (0.66) TLR9MEN1MAPTKMT2ALMNA
SCHEMBL18849687 0.89 TLR9 (0.66) TLR9MEN1MAPTKMT2ALMNA
SCHEMBL5528874 0.89 TLR9 (0.66) TLR9MEN1MAPTKMT2ALMNA
SCHEMBL572390 0.89 TLR9 (0.66) TLR9MEN1MAPTKMT2ALMNA
Ammonia Solution, Strong SCHEMBL27905491 0.87 LMNA (0.62) TLR9MEN1MAPTKMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110256259-B High wax content thick oil wax crystal and asphaltene dispersant and preparation method thereof 中国石油化工股份有限公司 2022-02-22 CN claimed
WO-2021108901-A1 NITRO-SUBSITUTED AROMATIC COMPOUNDS FOR USE IN ELECTRODES VALORBEC, S.E.C. (CA) 2021-06-10 WO claimed
CN-110256259-A A kind of high-content wax viscous crude wax is brilliant, asphaltene dispersants and preparation method thereof 中国石油化工股份有限公司 2019-09-20 CN claimed
CN-105693539-B Diamine monomer containing fluorene or fluorenone structure and having high planarity as well as synthesis method and application thereof 湖南工业大学 2019-01-25 CN claimed
CN-105693539-A Diamine monomer containing fluorene or fluorenone structure and having high planarity as well as synthesis method and application thereof 湖南工业大学 2016-06-22 CN claimed
US-7732534-B2 Polymers functionalized with nitro compounds BRIDGESTONE CORPORATION (JP) 2010-06-08 US claimed
US-20080051552-A1 Polymers functionalized with nitro compounds BRIDGESTONE CORPORATION 2008-02-28 US claimed
US-20080051519-A1 Polymers functionalized with nitro compounds BRIDGESTONE CORPORATION (JP) 2008-02-28 US claimed
EP-1172700-A2 Photoconductive imaging members Xerox Corporation (US) 2002-01-16 EP claimed
EP-0667562-B1 Charge injection barrier for positive charging organic photoconductor HEWLETT PACKARD CO (US) 2001-03-21 EP claimed
US-6194110-B1 Imaging members XEROX CORPORATION 2001-02-27 US claimed
US-5663030-A A PHENYL OR NORBORNANE DERIVATIVE AS AN ADDITIVE TO REDUCE HEAT AND ENERGY REQUIRED TO FUSE THE TONER AND TO REDUCE JAMMING OF THE EQUIPMENT XEROX CORPORATION (US) 1997-09-02 US claimed
JP-2207263-A None JP disclosed
JP-58187931-A None JP disclosed
JP-61109780-A None JP disclosed
EP-4131548-B1 NON-AQUEOUS ELECTROLYTE FOR BATTERY, PRECURSOR FOR LITHIUM SECONDARY BATTERY, METHOD FOR MANUFACTURING LITHIUM SECONDARY BATTERY, LITHIUM SECONDARY BATTERY, PHOSPHAZENE COMPOUND, AND ADDITIVE FOR BATTERY MITSUI CHEMICALS INC (JP) 2025-08-27 EP disclosed
EP-0071236-A1 Photosensitive lithographic plate MITSUBISHI KASEI CORPORATION (JP) 1983-02-09 EP disclosed
EP-0009223-B1 PHOTOSENSITIVE COMPOSITION MITSUBISHI KASEI CORPORATION (JP) 1982-11-10 EP disclosed
US-4258124-A Photosensitive composition MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) 1981-03-24 US disclosed
US-4205988-A Photochromic method involving an aromatic amine ASAHI KASEI K. K. (JP) 1980-06-03 US disclosed