Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18264436 | 0.89 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL14777633 | 0.87 | KDM4E (0.34) | ALDH1A1 | |
| SCHEMBL4687149 | 0.87 | KDM4E (0.34) | ALDH1A1 | |
| SCHEMBL14972900 | 0.87 | KDM4E (0.34) | ALDH1A1 | |
| SCHEMBL14777632 | 0.87 | KDM4E (0.34) | ALDH1A1 | |
| SCHEMBL12866047 | 0.85 | GAA (0.31) | — | |
| SCHEMBL6463525 | 0.84 | — | — | |
| SCHEMBL12866044 | 0.81 | CHRM2 (0.35) | — | |
| SCHEMBL16744068 | 0.81 | — | — | |
| SCHEMBL6467663 | 0.80 | ALDH1A1 (0.35) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-11829069-B2 | Photoresist compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-28 | — | — | US | disclosed |
| US-20180203352-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-07-19 | — | — | US | disclosed |
| US-20180059545-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2018-03-01 | — | — | US | disclosed |
| US-20170090287-A1 | OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2017-03-30 | — | — | US | disclosed |
| US-20170090283-A1 | PHOTORESIST COMPOSITIONS AND METHODS | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2017-03-30 | — | — | US | disclosed |
| US-20170090283-A1 | PHOTORESIST COMPOSITIONS AND METHODS | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2017-03-30 | — | — | US | disclosed |
| US-20170090287-A1 | OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2017-03-30 | — | — | US | disclosed |
| US-9541834-B2 | Ionic thermal acid generators for low temperature applications | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-10 | — | — | US | disclosed |
| US-9541834-B2 | Ionic thermal acid generators for low temperature applications | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-10 | — | — | US | disclosed |
| US-20120199957-A1 | PHOTORESISTS AND METHODS FOR USE THEREOF | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-08-09 | — | — | US | disclosed |
| EP-2472327-A1 | Photoresists and methods for use thereof | Rohm and Haas Electronic Materials LLC (US) | 2012-07-04 | — | — | EP | disclosed |
| US-20120129108-A1 | BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| US-20120129108-A1 | BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| US-20120077120-A1 | PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-03-29 | — | — | US | disclosed |
| US-20120077120-A1 | PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-03-29 | — | — | US | disclosed |
| EP-2428842-A1 | Photoresists comprising multi-amide component | Rohm and Haas Electronic Materials LLC (US) | 2012-03-14 | — | — | EP | disclosed |
| US-20110039210-A1 | NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-02-17 | — | — | US | disclosed |
| US-20110039210-A1 | NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-02-17 | — | — | US | disclosed |
| EP-2253647-A1 | Novel resins and photoresist compositions comprising same | Rohm and Haas Electronic Materials, L.L.C. (US) | 2010-11-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170090287-A1 | OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY | OGT, COLGALT1, PARG | ALDH1A1 2382/4885 |
| US-20120129108-A1 | BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ALAD, APEX1, HMBS | ALDH1A1 1611/4885 |
| US-20180059545-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | PARG, LCP1, ALG3 | ALDH1A1 894/4885 |
| US-20170090283-A1 | PHOTORESIST COMPOSITIONS AND METHODS | PARG, PNN, PARN | ALDH1A1 4826/4885 |
| US-20180203352-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | MAP1LC3C, LCP1, PIN1 | ALDH1A1 2061/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.