SCHEMBL9891432

SCHEMBL9891432

CC(C)(C)OC(=O)CCCNc1ccc([N+](=O)[O-])cc1

nearest known ligand 0.61

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MAPT P10636 13/20 0.61
KDM4E B2RXH2 3/20 0.61
ALDH1A1 P00352 8/20 0.58
GLA P06280 2/20 0.58
SMN1; SMN2 Q16637 2/20 0.58
HPGD P15428 1/20 0.55
ALOX12 P18054 1/20 0.55
GAA P10253 3/20 0.48
PKM P14618 1/20 0.48
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
HTT P42858 1/20 0.45
POLB P06746 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7242742 0.83 MAPT (0.53) MAPTKDM4EALDH1A1GLASMN1; SMN2
SCHEMBL23692652 0.83 MAPT (0.68) MAPTKDM4EALDH1A1GLASMN1; SMN2
SCHEMBL9891440 0.82 HDAC8 (0.46) MAPTKDM4EALDH1A1GLASMN1; SMN2
SCHEMBL25719186 0.82 MAPT (0.65) MAPTKDM4EALDH1A1GLASMN1; SMN2
SCHEMBL25719141 0.82 MAPT (0.65) MAPTKDM4EALDH1A1GLASMN1; SMN2
SCHEMBL9891433 0.82 HDAC8 (0.42) MAPTKDM4EALDH1A1SMN1; SMN2MEN1
SCHEMBL9891452 0.80 ALDH1A1 (0.48) MAPTALDH1A1POLB
SCHEMBL5623908 0.80 MAPT (0.59) MAPTKDM4EALDH1A1GLASMN1; SMN2
SCHEMBL9891441 0.80 POLB (0.42) MAPTKDM4EALDH1A1SMN1; SMN2POLB
SCHEMBL16369813 0.80 POLB (0.42) MAPTKDM4EPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
EP-2463714-B1 Basic compound, chemically amplified resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-28 EP disclosed
EP-2463714-A1 Basic compound, chemically amplified resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-06-13 EP disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS GABRA5, GABRB1, GABBR1 MAPT 2995/4885KDM4E 1359/4885ALDH1A1 789/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.