SCHEMBL9891433

SCHEMBL9891433

CC(C)(C)OC(=O)CCCNc1ccc(F)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC8 Q9BY41 1/20 0.42
FPR3 P25089 1/20 0.42
FPR2 P25090 1/20 0.42
MAPT P10636 4/20 0.40
KMT2A Q03164 3/20 0.40
MEN1 O00255 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
NPC1 O15118 1/20 0.40
XBP1 P17861 1/20 0.40
MAPK1 P28482 1/20 0.40
HTT P42858 1/20 0.40
RAB9A P51151 1/20 0.40
ALDH1A1 P00352 1/20 0.40
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
MGLL Q99685 1/20 0.39
KDM4E B2RXH2 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
HDAC3 O15379 2/20 0.38
HDAC1 Q13547 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9891452 0.86 ALDH1A1 (0.48) HDAC8FPR3FPR2MAPTALDH1A1
SCHEMBL9891440 0.85 HDAC8 (0.46) HDAC8FPR3FPR2MAPTSMN1; SMN2
SCHEMBL16369813 0.85 POLB (0.42) HDAC8FPR3FPR2MAPTMAPK1
SCHEMBL9891441 0.85 POLB (0.42) HDAC8FPR3FPR2MAPTSMN1; SMN2
SCHEMBL9891447 0.85 MAPT (0.53) HDAC8MAPTSMN1; SMN2NPC1HTT
SCHEMBL9891428 0.85 HDAC8 (0.43) HDAC8FPR3FPR2MAPTKMT2A
SCHEMBL9892881 0.83 MLYCD (0.45) HDAC8FPR3FPR2MGLLPOLB
SCHEMBL9892810 0.83 POLB (0.54) HDAC8MAPTKMT2AMEN1SMN1; SMN2
SCHEMBL9891431 0.83 HDAC8 (0.44) HDAC8FPR3FPR2MAPTKMT2A
SCHEMBL16745265 0.83 FPR3 (0.39) HDAC8FPR3FPR2MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
EP-2463714-A1 Basic compound, chemically amplified resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-06-13 EP disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS GABRA5, GABRB1, GABBR1 HDAC8 3609/4885FPR3 833/4885FPR2 1011/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.