SCHEMBL9891441

SCHEMBL9891441

CC(=O)c1ccc(NCCCC(=O)OC(C)(C)C)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.42
HDAC8 Q9BY41 1/20 0.40
FPR3 P25089 1/20 0.40
FPR2 P25090 1/20 0.40
MAPT P10636 3/20 0.39
NPC1 O15118 2/20 0.39
ALDH1A1 P00352 2/20 0.39
LMNA P02545 2/20 0.39
SCN5A Q14524 2/20 0.39
MAPK1 P28482 2/20 0.39
CYP1A2 P05177 1/20 0.39
MAOA P21397 1/20 0.39
CNR1 P21554 1/20 0.39
DRD4 P21917 1/20 0.39
ACHE P22303 1/20 0.39
HRH2 P25021 1/20 0.39
HTR2A P28223 1/20 0.39
HTR2C P28335 1/20 0.39
NTSR1 P30989 1/20 0.39
HRH1 P35367 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16369813 0.89 POLB (0.42) POLBHDAC8FPR3FPR2MAPT
SCHEMBL9892881 0.86 MLYCD (0.45) POLBHDAC8FPR3FPR2MGLL
SCHEMBL9891433 0.85 HDAC8 (0.42) POLBHDAC8FPR3FPR2MAPT
SCHEMBL9891452 0.84 ALDH1A1 (0.48) POLBHDAC8FPR3FPR2MAPT
SCHEMBL9891431 0.83 HDAC8 (0.44) POLBHDAC8FPR3FPR2MAPT
SCHEMBL9891447 0.83 MAPT (0.53) HDAC8MAPTNPC1ALDH1A1SMN1; SMN2
SCHEMBL9891440 0.83 HDAC8 (0.46) POLBHDAC8FPR3FPR2MAPT
SCHEMBL9891428 0.83 HDAC8 (0.43) POLBHDAC8FPR3FPR2MAPT
SCHEMBL9892810 0.81 POLB (0.54) POLBHDAC8MAPTALDH1A1SMN1; SMN2
SCHEMBL16745265 0.81 FPR3 (0.39) POLBHDAC8FPR3FPR2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
EP-2463714-A1 Basic compound, chemically amplified resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-06-13 EP disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS GABRA5, GABRB1, GABBR1 POLB 107/4885HDAC8 3609/4885FPR3 833/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.