Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9913255 | 0.77 | ALDH1A1 (0.57) | ALDH1A1L3MBTL1 | |
| SCHEMBL28980551 | 0.77 | ALDH1A1 (0.57) | ALDH1A1L3MBTL1 | |
| SCHEMBL12148586 | 0.77 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1 | |
| SCHEMBL15491315 | 0.76 | DGAT1 (0.34) | ALDH1A1L3MBTL1MAPK1SMN1; SMN2 | |
| SCHEMBL12417902 | 0.74 | CA1 (0.45) | ALDH1A1L3MBTL1 | |
| SCHEMBL27849194 | 0.73 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1MAPK1SMN1; SMN2 | |
| SCHEMBL11917859 | 0.72 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1 | |
| SCHEMBL10438403 | 0.70 | CA1 (0.35) | ALDH1A1L3MBTL1MAPK1SMN1; SMN2 | |
| SCHEMBL22289461 | 0.70 | CA2 (0.33) | ALDH1A1L3MBTL1 | |
| SCHEMBL13070971 | 0.69 | ALDH1A1 (0.36) | ALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9951164-B2 | Non-ionic aryl ketone based polymeric photo-acid generators | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-04-24 | — | — | US | disclosed |
| US-20180044459-A1 | NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS | CENTRAL GLASS CO., LTD. (JP) | 2018-02-15 | — | — | US | disclosed |
| US-8557499-B2 | Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2013-10-15 | — | — | US | disclosed |
| US-8283102-B2 | Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2012-10-09 | — | — | US | disclosed |
| US-8158327-B2 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2012-04-17 | — | — | US | disclosed |
| US-20120076996-A1 | RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-8026390-B2 | Photoacid generator containing aromatic ring | Korea Kumho Petrochenicals Co., Ltd. (KR) | 2011-09-27 | — | — | US | disclosed |
| US-20110008731-A1 | ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20100143843-A1 | PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION | KOREA KUMHO PETROCHEMICAL CO., LTD. | 2010-06-10 | — | — | US | disclosed |
| US-20100113818-A1 | Photoacid generator containing aromatic ring | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2010-05-06 | — | — | US | disclosed |
| US-20100075256-A1 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2010-03-25 | — | — | US | disclosed |
| EP-0996606-B1 | CATALYSED FLUORINATION OF CARBONYL COMPOUNDS | F2 CHEMICALS LTD (GB) | 2002-01-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180044459-A1 | NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS | PPARG, PPARA, PPARD | ALDH1A1 568/4885L3MBTL1 1806/4885MAPK1 777/4885 |
| US-20110008731-A1 | ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION | RER1, XRN2, RXRA | ALDH1A1 2195/4885L3MBTL1 4102/4885MAPK1 2514/4885 |
| US-20100113818-A1 | Photoacid generator containing aromatic ring | HAO2, PAH, PPOX | ALDH1A1 1112/4885L3MBTL1 3860/4885MAPK1 2032/4885 |
| US-20100143843-A1 | PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION | POLL, PARG, POLH | ALDH1A1 4004/4885L3MBTL1 4613/4885MAPK1 2957/4885 |
| US-20100075256-A1 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition | ARF5, ARL1, FGFR2 | ALDH1A1 3581/4885L3MBTL1 3398/4885MAPK1 612/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.