Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 2/20 | 0.46 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 4/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.38 |
| ▸ | HMGCR | P04035 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | FKBP1A | P62942 | 3/20 | 0.36 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.35 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9916136 | 0.98 | NAAA (0.45) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL16784766 | 0.92 | APOBEC3A (0.37) | NAAAEPHX1HTTCYP19A1HMGCR | |
| SCHEMBL17550540 | 0.85 | NAAA (0.46) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL2734982 | 0.85 | HMGCR (0.37) | NAAAEPHX1HTTCYP19A1HMGCR | |
| SCHEMBL16591000 | 0.84 | HMGCR (0.36) | NAAAEPHX1HTTCYP19A1HMGCR | |
| SCHEMBL17589175 | 0.84 | ALDH1A1 (0.33) | NAAACYP19A1HMGCRSMN1; SMN2APOBEC3A | |
| SCHEMBL3434643 | 0.83 | EPHX1 (0.50) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL20388945 | 0.83 | EPHX1 (0.50) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL131561 | 0.83 | EPHX1 (0.50) | NAAAEPHX1HTTCYP2C19CYP19A1 | |
| SCHEMBL108478 | 0.83 | EPHX1 (0.50) | NAAAEPHX1HTTCYP2C19CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-12-12 | — | — | US | disclosed |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-12-12 | — | — | US | disclosed |
| US-11820735-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20150118619-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-04-30 | — | — | US | disclosed |
| US-20150118620-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-04-30 | — | — | US | disclosed |
| US-20150064622-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-05 | — | — | US | disclosed |
| US-8859183-B2 | N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8753794-B2 | N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20140038106-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2014-02-06 | — | — | US | disclosed |
| US-20140030654-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-01-30 | — | — | US | disclosed |
| US-8486606-B2 | Acrylate derivative, haloester derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2013-07-16 | — | — | US | disclosed |
| US-20120148954-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20110117497-A1 | ACRYLATE DERIVATIVE, HALOESTER DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2011-05-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11820735-B2 | Salt, acid generator, resist composition and method for producing resist pattern | RER1, LPAR1, TLR7 | NAAA 2842/4885EPHX1 2018/4885HTT 3918/4885 |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | NAAA 1093/4885EPHX1 808/4885HTT 3041/4885 |
| US-20120148954-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | COASY, ARCN1, CLTB | NAAA 326/4885EPHX1 4678/4885HTT 3362/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | NAAA 2282/4885EPHX1 2752/4885HTT 3191/4885 |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, HCN3, RER1 | NAAA 1447/4885EPHX1 1269/4885HTT 3074/4885 |
| US-20110117497-A1 | ACRYLATE DERIVATIVE, HALOESTER DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | ARCN1, H1-10, RER1 | NAAA 2974/4885EPHX1 2464/4885HTT 830/4885 |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, H1-2 | NAAA 877/4885EPHX1 2287/4885HTT 3017/4885 |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | RER1, H1-0, CA7 | NAAA 1606/4885EPHX1 2963/4885HTT 3542/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.