SCHEMBL9951055

SCHEMBL9951055

CC1CCC(CCc2cccc(C3OCCO3)c2)CC1

nearest known ligand 0.37

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
MAOB P27338 2/20 0.34
MAOA P21397 1/20 0.34
ALDH1A1 P00352 1/20 0.34
HTT P42858 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
DRD2 P14416 1/20 0.33
DRD1 P21728 1/20 0.33
DRD4 P21917 1/20 0.33
DRD5 P21918 1/20 0.33
DRD3 P35462 1/20 0.33
TACR1 P25103 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9949911 0.89 ALDH1A1 (0.36) MAOBMAOAALDH1A1HTTSMN1; SMN2
SCHEMBL9950932 0.89 DRD2 (0.38) MAOBMAOAALDH1A1HTTSMN1; SMN2
SCHEMBL9951096 0.86 OPRM1 (0.39) MAOBMAOAALDH1A1HTTSMN1; SMN2
SCHEMBL9950597 0.86 SMN1; SMN2 (0.35) ALDH1A1HTTSMN1; SMN2
SCHEMBL9949969 0.84 ALDH1A1 (0.34) ALDH1A1HTTSMN1; SMN2DRD2DRD1
SCHEMBL9951286 0.82 ALOX5 (0.35) MAOBMAOA
SCHEMBL9950577 0.79 DRD2 (0.38) ALDH1A1HTTSMN1; SMN2DRD2DRD1
SCHEMBL9950435 0.79 ALDH1A1 (0.36) ALDH1A1HTTSMN1; SMN2DRD2DRD1
SCHEMBL9949826 0.78 ALDH1A1 (0.35) ALDH1A1HTTSMN1; SMN2DRD2DRD1
SCHEMBL9949723 0.78 ALDH1A1 (0.36) ALDH1A1HTTSMN1; SMN2DRD2DRD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 MAOB 4132/4885MAOA 4597/4885ALDH1A1 1204/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.