Water

Water

SCHEMBL997407

C=C(C)S.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23770 0.94
SCHEMBL28887713 0.89
Water SCHEMBL4668731 0.76
Water SCHEMBL4622030 0.76
Bicarbonate SCHEMBL28731903 0.74
SCHEMBL14541865 0.74
Fluoride SCHEMBL28099450 0.71
SCHEMBL21437103 0.70
SCHEMBL6799285 0.68 ALDH1A1 (0.46)
SCHEMBL10871026 0.68 ALDH1A1 (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110655871-A Polymer composition containing silane groups and coatings containing the same 欧美诺华解决方案公司 2020-01-07 CN disclosed
US-10259928-B2 Silane group-containing polymer composition and coatings containing same OMNOVA SOLUTIONS INC. (US) 2019-04-16 US disclosed
US-10253202-B2 Protective coating compositions OMNOVA SOLUTIONS INC. (US) 2019-04-09 US disclosed
US-20170226368-A9 PROTECTIVE COATING COMPOSITIONS SYNTHOMER INC. 2017-08-10 US disclosed
US-20160185997-A1 PROTECTIVE COATING COMPOSITIONS GLAS TRUST CORPORATION LIMITED, AS SECURITY AGENT (GB) 2016-06-30 US disclosed
US-8940826-B2 Protective coating compositions OMNOVA SOLUTIONS INC. (US) 2015-01-27 US disclosed
EP-2807223-A2 SILANE GROUP-CONTAINING POLYMER COMPOSITION AND COATINGS CONTAINING SAME Omnova Solutions Inc (US) 2014-12-03 EP disclosed
WO-2013112683-A2 SILANE GROUP-CONTAINING POLYMER COMPOSITION AND COATINGS CONTAINING SAME OMNOVA SOLUTIONS INC. (US) 2013-08-01 WO disclosed
US-20120157595-A1 PROTECTIVE COATING COMPOSITIONS GLAS TRUST CORPORATION LIMITED, AS SECURITY AGENT (GB) 2012-06-21 US disclosed
US-7932313-B2 Aqueous compositions with polyvalent metal ions and dispersed polymers ROHM AND HAAS COMPANY (US) 2011-04-26 US disclosed
EP-0943668-B1 Process of improving the leveling of a floor polish composition ROHM & HAAS (US) 2005-02-09 EP disclosed
EP-0900833-B1 Polymer for improving the burnish response of a floor polish ROHM & HAAS (US) 2004-06-30 EP disclosed
US-6548596-B1 Aqueous suspension of water insoluble butyl methacrylate-isobutyl methacrylate copolymer comprising acid monomer; floor polish burnish response ROHM AND HAAS COMPANY 2003-04-15 US disclosed
US-6043314-A DIVALENT COPPER ION CROSSLINKING AGENT, POLYMER BEING PREPARED FROM MORE THAN ONE ETHYLENICALLY UNSATURATED MONOMER AND ACID CONTAININGFUNCTIONAL RESIDUES, ROHM AND HAAS COMPANY (US) 2000-03-28 US disclosed
EP-0943668-A1 Process of improving the leveling of a floor polish composition ROHM AND HAAS COMPANY (US) 1999-09-22 EP disclosed
EP-0943669-A1 Process of improving the appearance of a floor polish composition ROHM AND HAAS COMPANY (US) 1999-09-22 EP disclosed
EP-0900833-A1 Polymer for improving the burnish response of a floor polish ROHM AND HAAS COMPANY (US) 1999-03-10 EP disclosed
EP-0120712-B1 POLISH COMPOSITIONS AND POLISH VEHICLES USEFUL THEREIN ROHM AND HAAS COMPANY (US) 1987-06-24 EP disclosed
US-4517330-A ACID COPOLYMER CROSSLINKING WITH TRANSITION METAL ROHM AND HAAS COMPANY (US) 1985-05-14 US disclosed
EP-0120712-A2 Polish compositions and polish vehicles useful therein ROHM AND HAAS COMPANY (US) 1984-10-03 EP disclosed