Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.51 |
| ▸ | GRM1 | Q13255 | 6/20 | 0.44 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.43 |
| ▸ | CTSV | O60911 | 1/20 | 0.37 |
| ▸ | CTSL | P07711 | 1/20 | 0.37 |
| ▸ | CTSS | P25774 | 1/20 | 0.37 |
| ▸ | CTSK | P43235 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | PDE4A | P27815 | 3/20 | 0.35 |
| ▸ | PDE4B | Q07343 | 3/20 | 0.35 |
| ▸ | PDE4C | Q08493 | 3/20 | 0.35 |
| ▸ | PDE4D | Q08499 | 3/20 | 0.35 |
| ▸ | IRAK4 | Q9NWZ3 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27102031 | 0.89 | ATM (0.41) | ATMGRM1CYP19A1CTSVCTSL | |
| SCHEMBL6854606 | 0.89 | ATM (0.51) | ATMGRM1CYP19A1CTSVCTSL | |
| SCHEMBL19038481 | 0.88 | ATM (0.41) | ATMGRM1CYP19A1CTSVCTSL | |
| SCHEMBL17550548 | 0.84 | CYP19A1 (0.47) | ATMGRM1CYP19A1CTSVCTSL | |
| SCHEMBL786222 | 0.83 | ATM (0.46) | ATMGRM1CYP19A1CTSVCTSL | |
| SCHEMBL12256172 | 0.81 | ATM (0.51) | ATMGRM1CYP19A1CTSVCTSL | |
| SCHEMBL6848141 | 0.81 | ATM (0.42) | ATMGRM1CYP19A1CTSVCTSL | |
| SCHEMBL6854496 | 0.80 | CYP19A1 (0.47) | ATMGRM1CYP19A1CTSVCTSL | |
| SCHEMBL15279647 | 0.80 | ATM (0.40) | ATMGRM1CYP19A1CTSVCTSL | |
| SCHEMBL15279601 | 0.80 | ATM (0.40) | ATMGRM1CYP19A1LMNAHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250313523-A1 | FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES | OSMO LABS, PBC | 2025-10-09 | — | — | US | disclosed |
| CN-119856290-A | Composite particle, method for producing same, electrode for electrochemical element, and electrochemical element | 日本瑞翁株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-114651026-B | Cyclic olefin polymer, process for producing the same, and optical element | 日本瑞翁株式会社 | 2024-12-27 | — | — | CN | disclosed |
| CN-114341228-B | Cyclic polymer hydride, process for producing the same, and resin composition | 日本瑞翁株式会社 | 2024-11-26 | — | — | CN | disclosed |
| CN-118284996-A | Composite particle, method for producing same, electrode for electrochemical element, and electrochemical element | 日本瑞翁株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-117769772-A | Composite particle, electrode for electrochemical element, and electrochemical element | 日本瑞翁株式会社 | 2024-03-26 | — | — | CN | disclosed |
| CN-117769769-A | Composite particle and method for producing electrode for electrochemical element | 日本瑞翁株式会社 | 2024-03-26 | — | — | CN | disclosed |
| CN-116964124-A | Random copolymer and method for producing same | 日本瑞翁株式会社 | 2023-10-27 | — | — | CN | disclosed |
| CN-116918158-A | Composition for functional layer of electrochemical element, functional layer for electrochemical element, laminate for electrochemical element, and electrochemical element | 日本瑞翁株式会社 | 2023-10-20 | — | — | CN | disclosed |
| CN-116867832-A | Cyclic olefin copolymer, hydrogenated product thereof, and optical element | 日本瑞翁株式会社 | 2023-10-10 | — | — | CN | disclosed |
| CN-113557258-B | Ring-opened polymer hydride, resin composition, and molded article | 日本瑞翁株式会社 | 2023-09-05 | — | — | CN | disclosed |
| US-9760005-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9599897-B2 | Salt, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-03-21 | — | — | US | disclosed |
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20160052877-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-8114813-B2 | Heat transferrable dye in resin containing polyvinyl acetal modified with ketone | FUJIFILM CORPORATION (JP) | 2012-02-14 | — | — | US | disclosed |
| US-20110091812-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20080242540-A1 | THERMAL TRANSFER INK SHEET, INK CARTRIDGE, COATING COMPOSITION FOR DYE LAYER OF THERMAL TRANSFER INK SHEET, AND THERMAL TRANSFER RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | XDH, HAX1, MLX | ATM 3009/4885GRM1 463/4885CYP19A1 328/4885 |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | C1R, C1S, RER1 | ATM 3551/4885GRM1 341/4885CYP19A1 1188/4885 |
| US-20250313523-A1 | FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES | CYP8B1, CYP1B1, BBOX1 | ATM 4541/4885GRM1 1509/4885CYP19A1 92/4885 |
| US-20160052877-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, AFF1, FRG1 | ATM 3816/4885GRM1 342/4885CYP19A1 2813/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.