SCHEMBL1005538

SCHEMBL1005538

C=CCO[CH]CCCCCCCCCC

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.56
ALDH1A1 P00352 1/20 0.42
FAAH O00519 3/20 0.35
TRPV1 Q8NER1 1/20 0.35
TERT O14746 3/20 0.35
PTPN1 P18031 3/20 0.35
PPARG P37231 3/20 0.35
PPARD Q03181 3/20 0.35
PPARA Q07869 3/20 0.35
MAPT P10636 2/20 0.35
BLM P54132 2/20 0.35
HSD17B10 Q99714 2/20 0.35
FABP4 P15090 2/20 0.35
GMNN O75496 1/20 0.35
USP2 O75604 1/20 0.35
LMNA P02545 1/20 0.35
CYP1A2 P05177 1/20 0.35
POLB P06746 1/20 0.35
CYP2C9 P11712 1/20 0.35
ALOX15 P16050 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9483035 1.00 TSHR (0.56) TSHRALDH1A1FAAHTRPV1TERT
SCHEMBL9484158 1.00 TSHR (0.56) TSHRALDH1A1FAAHTRPV1TERT
SCHEMBL3679041 1.00 TSHR (0.56) TSHRALDH1A1FAAHTRPV1TERT
SCHEMBL9483889 1.00 TSHR (0.56) TSHRALDH1A1FAAHTRPV1TERT
SCHEMBL923936 0.98 TSHR (0.52) TSHRALDH1A1FAAHTERTPTPN1
SCHEMBL924284 0.91
SCHEMBL926526 0.81
SCHEMBL11792380 0.79 TSHR (0.52) TSHRALDH1A1FAAHTRPV1TERT
SCHEMBL11792388 0.79 TSHR (0.52) TSHRALDH1A1FAAHTRPV1TERT
SCHEMBL5399347 0.79 TSHR (0.52) TSHRALDH1A1FAAHTRPV1TERT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10777809-B2 Method for producing negative electrode active material for lithium ion secondary batteries JNC CORPORATION (JP) 2020-09-15 US disclosed
EP-3442060-B1 METHOD FOR PRODUCING NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM ION SECONDARY BATTERIES JNC CORP (JP) 2020-06-03 EP disclosed
US-20190131621-A1 METHOD FOR PRODUCING NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM ION SECONDARY BATTERIES JNC CORPORATION (JP) 2019-05-02 US disclosed
EP-3442060-A1 METHOD FOR PRODUCING NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM ION SECONDARY BATTERIES JNC Corporation (JP) 2019-02-13 EP disclosed
US-9817312-B2 Silicon-containing heat- or photo-curable composition AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L. (LU) 2017-11-14 US disclosed
US-20160266490-A1 SILICON-CONTAINING HEAT- OR PHOTO-CURABLE COMPOSITION AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2016-09-15 US disclosed
EP-3061792-A1 SILICON-CONTAINING HEAT- OR PHOTO-CURABLE COMPOSITION AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2016-08-31 EP disclosed
US-20140275463-A1 ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME CHISSO PETROCHEMICAL CORPORATION (JP) 2014-09-18 US disclosed
EP-1548020-B1 SILICON COMPOUND JNC CORP (JP) 2014-07-23 EP disclosed
EP-1550664-B1 SILICON COMPOUND JNC CORP (JP) 2012-06-27 EP disclosed
US-20050288468-A1 Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers JNC CORPORATION (JP) 2005-12-29 US disclosed
US-20050250925-A1 Silicon compound JNC CORPORATION (JP) 2005-11-10 US disclosed
US-20050215807-A1 Silsesquioxane derivative JNC CORPORATION (JP) 2005-09-29 US disclosed
EP-1550664-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-07-06 EP disclosed
EP-1548020-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-06-29 EP disclosed
US-20040249103-A1 Silsesquioxane derivatives and process for production thereof JNC CORPORATION (JP) 2004-12-09 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed
EP-1428795-A1 SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF CHISSO CORPORATION (JP) 2004-06-16 EP disclosed
US-20040068074-A1 Production process for silsesquioxane derivative having functional group and silsesquioxane derivative JNC CORPORATION (JP) 2004-04-08 US disclosed
US-20040030084-A1 Production process for silsesquioxane derivative and silsesquioxane derivative JNC CORPORATION (JP) 2004-02-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140275463-A1 ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME PIEZO1, PFAS, MCM6 TSHR 4775/4885ALDH1A1 1255/4885FAAH 1951/4885
US-20050215807-A1 Silsesquioxane derivative STS, SFXN1, SULT1A1 TSHR 4284/4885ALDH1A1 535/4885FAAH 3878/4885
US-20050288468-A1 Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers STS, SULT1A1, SRM TSHR 3372/4885ALDH1A1 384/4885FAAH 2218/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.