Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 2/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.52 |
| ▸ | NPC1 | O15118 | 1/20 | 0.52 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.51 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | PARP1 | P09874 | 1/20 | 0.46 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | SGMS2 | Q8NHU3 | 2/20 | 0.45 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.45 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6722042 | 0.87 | LMNA (0.49) | RAB9AL3MBTL1NPC1KDM4EPARP1 | |
| SCHEMBL10178720 | 0.86 | ALDH1A1 (0.49) | RAB9ANPC1HSP90AA1KDM4EHTT | |
| SCHEMBL10411181 | 0.86 | SLC6A3 (0.58) | RAB9AL3MBTL1KDM4EHTTPARP1 | |
| SCHEMBL10179052 | 0.85 | NPC1 (0.54) | RAB9AL3MBTL1NPC1HSP90AA1KDM4E | |
| SCHEMBL13144216 | 0.83 | SLC6A3 (0.65) | RAB9AL3MBTL1NPC1HSP90AA1KDM4E | |
| SCHEMBL978857 | 0.82 | HTT (0.64) | L3MBTL1NPC1HTTSLC6A3LMNA | |
| SCHEMBL5309541 | 0.81 | KMT2A (0.64) | RAB9AL3MBTL1NPC1KDM4ESLC6A3 | |
| SCHEMBL13044291 | 0.81 | SGMS2 (0.55) | RAB9AL3MBTL1KDM4EHTTPARP1 | |
| SCHEMBL4002825 | 0.79 | FFAR4 (0.55) | L3MBTL1NPC1KDM4EHTTPARP1 | |
| SCHEMBL15627054 | 0.79 | NPC1 (0.47) | RAB9AL3MBTL1NPC1HSP90AA1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |