SCHEMBL10178720

SCHEMBL10178720

CCC(C)c1cccc(COc2ccccc2C(=O)OC)c1

nearest known ligand 0.49

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.49
SMN1; SMN2 Q16637 3/20 0.49
KDM4E B2RXH2 2/20 0.49
NPC1 O15118 2/20 0.49
RAB9A P51151 2/20 0.49
HPGD P15428 2/20 0.49
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
HTT P42858 4/20 0.43
MRGPRX4 Q96LA9 2/20 0.43
HSP90AA1 P07900 1/20 0.43
MAPT P10636 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
LMNA P02545 2/20 0.43
CFD P00746 1/20 0.43
F11 P03951 1/20 0.43
TPSB2 P20231 1/20 0.43
MAPK1 P28482 1/20 0.43
SGMS2 Q8NHU3 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178559 0.88 MEN1 (0.48) ALDH1A1SMN1; SMN2KDM4EMEN1KMT2A
SCHEMBL10178572 0.87 NPC1 (0.44) ALDH1A1SMN1; SMN2KDM4ENPC1RAB9A
SCHEMBL10178634 0.86 RAB9A (0.52) ALDH1A1KDM4ENPC1RAB9AHPGD
SCHEMBL978857 0.79 HTT (0.64) ALDH1A1SMN1; SMN2NPC1MEN1KMT2A
SCHEMBL3811276 0.79 KDM4E (0.60) ALDH1A1SMN1; SMN2KDM4ENPC1RAB9A
SCHEMBL2453770 0.79 SGMS2 (0.58) ALDH1A1SMN1; SMN2KDM4ENPC1RAB9A
SCHEMBL6564745 0.79 ALDH1A1 (0.54) ALDH1A1SMN1; SMN2KDM4ENPC1RAB9A
SCHEMBL10178735 0.78 LMNA (0.56) ALDH1A1SMN1; SMN2KDM4EMEN1KMT2A
SCHEMBL10179112 0.78 PTGER1 (0.50) KDM4EHTTMRGPRX4MAPTLMNA
SCHEMBL454367 0.78 NPC1 (0.61) ALDH1A1SMN1; SMN2KDM4ENPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed