SCHEMBL10179052

SCHEMBL10179052

CCC(C)c1ccc(COc2cc3ccccc3cc2C(=O)OC)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 4/20 0.54
RAB9A P51151 4/20 0.54
HSP90AA1 P07900 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
ALDH1A1 P00352 2/20 0.44
TSHR P16473 1/20 0.44
KDM4E B2RXH2 1/20 0.43
FFAR4 Q5NUL3 1/20 0.42
CTSV O60911 1/20 0.42
CTSL P07711 1/20 0.42
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
AHR P35869 1/20 0.41
CASP1 P29466 1/20 0.41
KEAP1 Q14145 1/20 0.41
NFE2L2 Q16236 1/20 0.41
MAPT P10636 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
PTPRE P23469 1/20 0.41
ALOX5 P09917 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178572 0.89 NPC1 (0.44) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL10178634 0.85 RAB9A (0.52) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL13144215 0.85 SLC6A3 (0.46) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL15613848 0.81 NPC1 (0.59) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL14866949 0.76 ALOX5 (0.61) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL8204838 0.76 HDAC8 (0.53) NPC1RAB9AKDM4ECTSVCTSL
SCHEMBL10178720 0.75 ALDH1A1 (0.49) NPC1RAB9AHSP90AA1ALDH1A1KDM4E
SCHEMBL7910727 0.75 RXRA (0.54) NPC1RAB9AALDH1A1KDM4EFFAR4
SCHEMBL14866835 0.75 SMN1; SMN2 (0.39) NPC1RAB9AL3MBTL1ALDH1A1MAPT
SCHEMBL6722042 0.75 LMNA (0.49) NPC1RAB9AL3MBTL1ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed