Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 14/20 | 0.61 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.59 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.49 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.49 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.49 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.49 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.49 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.49 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.49 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.49 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.49 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.49 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.49 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7781306 | 1.00 | ACHE (0.61) | ACHEEPHX1HDAC3HDAC4HDAC1 | |
| SCHEMBL12417367 | 1.00 | ACHE (0.61) | ACHEEPHX1HDAC3HDAC4HDAC1 | |
| SCHEMBL27712904 | 1.00 | ACHE (0.61) | ACHEEPHX1HDAC3HDAC4HDAC1 | |
| SCHEMBL7570219 | 0.98 | ACHE (0.61) | ACHEEPHX1HDAC3HDAC4HDAC1 | |
| SCHEMBL5696599 | 0.94 | EPHX1 (0.70) | ACHEEPHX1 | |
| SCHEMBL1857424 | 0.94 | EPHX1 (0.70) | ACHEEPHX1 | |
| SCHEMBL1836300 | 0.94 | ACHE (0.55) | ACHEEPHX1HDAC3HDAC4HDAC1 | |
| SCHEMBL4647121 | 0.94 | EPHX1 (0.70) | ACHEEPHX1 | |
| SCHEMBL2987477 | 0.94 | EPHX1 (0.70) | ACHEEPHX1 | |
| SCHEMBL2987259 | 0.94 | EPHX1 (0.70) | ACHEEPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 249 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-16 | — | — | US | claimed |
| US-12547075-B2 | Method of forming photoresist pattern | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-02-10 | — | — | US | claimed |
| EP-3472218-B1 | THREE DIMENSIONAL FABRICATING MATERIAL SYSTEMS AND METHODS FOR PRODUCING LAYERED DENTAL PRODUCTS | DENTSPLY SIRONA INC (US) | 2023-08-09 | — | — | EP | claimed |
| US-8927763-B2 | Method for preparing aliphatic diisocyanate | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2015-01-06 | — | — | US | claimed |
| US-20140303399-A1 | METHOD FOR PREPARING ALIPHATIC DIISOCYANATE | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2014-10-09 | — | — | US | claimed |
| EP-0699312-B1 | METHOD FOR MAKING COLORED CONTACT LENSES AND COLOR COATING COMPOSITION | BENSKY FREDDIE (FI) | 2000-03-08 | — | — | EP | claimed |
| US-6410778-B1 | — | — | None | — | — | US | disclosed |
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-05-26 | — | — | US | disclosed |
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-21 | — | — | US | disclosed |
| CN-122028714-A | Method for manufacturing semiconductor device and composition for coating patterned photoresist | 台湾积体电路制造股份有限公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-07 | — | — | US | disclosed |
| US-12619148-B2 | Crosslinkable photoresist for extreme ultraviolet lithography | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-05-05 | — | — | US | disclosed |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-16 | — | — | US | disclosed |
| US-4388246-A | THERMAL SPLITTING OF CARBAMATES | BAYER AKTIENGESELLSCHAFT (DE) | 1983-06-14 | — | — | US | disclosed |
| EP-0018588-B1 | PROCESS FOR PREPARING ALIPHATIC AND CYCLOALIPHATIC DI- AND POLYURETHANES | BASF Aktiengesellschaft (DE) | 1982-12-29 | — | — | EP | disclosed |
| EP-0018586-B1 | PROCESS FOR PREPARING ALIPHATIC AND CYCLOALIPHATIC DI- AND POLYURETHANES | BASF Aktiengesellschaft (DE) | 1982-12-08 | — | — | EP | disclosed |
| EP-0027954-B1 | PROCESS FOR PREPARING URETHANES AND THEIR USE IN THE PREPARATION OF ISOCYANATES | BAYER AG (DE) | 1982-11-24 | — | — | EP | disclosed |
| EP-0061013-A1 | Process for the preparation of polyisocyanates | BAYER AG (DE) | 1982-09-29 | — | — | EP | disclosed |
| EP-0027954-A1 | Process for preparing urethanes and their use in the preparation of isocyanates | BAYER AG (DE) | 1981-05-06 | — | — | EP | disclosed |
| EP-0018588-A1 | Process for preparing aliphatic and cycloaliphatic di- and polyurethanes | BASF Aktiengesellschaft (DE) | 1980-11-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | INO80C, INO80, NAT10 | ACHE 3949/4885EPHX1 4283/4885HDAC3 818/4885 |
| US-20140303399-A1 | METHOD FOR PREPARING ALIPHATIC DIISOCYANATE | ALKBH3, DDC, ALKBH5 | ACHE 2311/4885EPHX1 3411/4885HDAC3 639/4885 |
| US-12619148-B2 | Crosslinkable photoresist for extreme ultraviolet lithography | LBR, ARCN1, ERCC1 | ACHE 4762/4885EPHX1 3076/4885HDAC3 1464/4885 |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | C9, C1S, ZKSCAN2 | ACHE 1474/4885EPHX1 1231/4885HDAC3 153/4885 |
| US-12547075-B2 | Method of forming photoresist pattern | ALKBH2, ALKBH1, ALKBH3 | ACHE 2315/4885EPHX1 3589/4885HDAC3 3244/4885 |
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | DSG1, SCO2, ERCC1 | ACHE 2984/4885EPHX1 744/4885HDAC3 3994/4885 |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | DSTN, PFAS, DNTT | ACHE 4489/4885EPHX1 1694/4885HDAC3 3677/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.