SCHEMBL103404

SCHEMBL103404

Fc1ccc2[nH]nnc2c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
METAP2 P50579 1/20 0.38
KDM4E B2RXH2 3/20 0.38
AHR P35869 2/20 0.38
CYP2C19 P33261 2/20 0.35
PDPK1 O15530 1/20 0.35
ALDH1A1 P00352 1/20 0.35
LMNA P02545 1/20 0.35
HPGD P15428 1/20 0.35
TSHR P16473 1/20 0.35
NFKB1 P19838 1/20 0.35
APEX1 P27695 1/20 0.35
HSD17B10 Q99714 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
ACHE P22303 1/20 0.35
KMT2A Q03164 1/20 0.34
MAP2K4 P45985 1/20 0.34
ALPL P05186 1/20 0.34
ALPI P09923 1/20 0.34
ALPG P10696 1/20 0.34
CHUK O15111 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12320106 0.83 ALPL (0.42) METAP2KDM4EAHRMAP2K4ALPL
SCHEMBL19640293 0.77 CLK1 (0.34) PDE3BPDE3A
SCHEMBL23348984 0.76 CLK1 (0.37) PDPK1NPC1PDE3BPDE3A
SCHEMBL1156044 0.74
SCHEMBL103309 0.74 CYP1A2 (0.39) ALDH1A1LMNAHPGDACHEKMT2A
SCHEMBL2333507 0.74
SCHEMBL171634 0.74 NOS1 (0.44)
SCHEMBL203784 0.74 F7 (0.48) KDM4EAHRALDH1A1HPGDTSHR
SCHEMBL242787 0.74 ALDH1A1 (0.48) KDM4EPDPK1ALDH1A1LMNAHPGD
SCHEMBL7261306 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 347 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12590224-B2 Chemical mechanical polishing compositions and methods of use thereof FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2026-03-31 US claimed
EP-4647474-A2 CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM Electronic Materials U.S.A., Inc. (US) 2025-11-12 EP claimed
EP-3774680-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2025-09-24 EP claimed
US-12187984-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2025-01-07 US claimed
CN-119220351-A Application of cleaning liquid 上海新阳半导体材料股份有限公司 2024-12-31 CN claimed
CN-119220352-A Preparation method of cleaning liquid 上海新阳半导体材料股份有限公司 2024-12-31 CN claimed
CN-119098583-A Composite copper powder and preparation method and application thereof 隆基绿能科技股份有限公司 2024-12-10 CN claimed
US-12139693-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2024-11-12 US claimed
EP-3672944-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2024-08-07 EP claimed
US-20240174924-A1 ETCHING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-05-30 US claimed
EP-3077129-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FujiFilm Electronic Materials USA, Inc. (US) 2016-10-12 EP claimed
EP-3060642-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FujiFilm Electronic Materials USA, Inc. (US) 2016-08-31 EP claimed
US-20150267112-A1 Etching Composition FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-09-24 US claimed
WO-2015142778-A1 ETCHING COMPOSITION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-09-24 WO claimed
WO-2015089023-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-06-18 WO claimed
US-20150159125-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-06-11 US claimed
WO-2015084921-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-06-11 WO claimed
US-20150159124-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-06-11 US claimed
WO-2015060954-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-04-30 WO claimed
US-20150111804-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-04-23 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12590224-B2 Chemical mechanical polishing compositions and methods of use thereof PHOSPHO1, ACP1, PLEC METAP2 1093/4885KDM4E 1188/4885AHR 2733/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.