Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | AOC3 | Q16853 | 2/20 | 0.35 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.35 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.35 |
| ▸ | HTR1A | P08908 | 1/20 | 0.35 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.35 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.35 |
| ▸ | DRD1 | P21728 | 1/20 | 0.35 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.35 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.35 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.35 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.35 |
| ▸ | DRD3 | P35462 | 1/20 | 0.35 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.35 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.35 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.35 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL534112 | 0.83 | TP53 (0.42) | TP53TSHRALDH1A1SMN1; SMN2AOC3 | |
| SCHEMBL12458733 | 0.81 | ESR1 (0.34) | — | |
| SCHEMBL12458724 | 0.81 | ESR1 (0.34) | — | |
| SCHEMBL2806315 | 0.80 | TP53 (0.44) | TP53TSHRALDH1A1TAAR1SLC6A2 | |
| SCHEMBL104109 | 0.80 | TP53 (0.44) | TP53TSHRALDH1A1SMN1; SMN2TAAR1 | |
| SCHEMBL3338279 | 0.80 | TP53 (0.44) | TP53TSHRALDH1A1KCNH2CALM1 | |
| SCHEMBL5388447 | 0.79 | TSHR (0.42) | TP53TSHRALDH1A1AOC3TAAR1 | |
| SCHEMBL104845 | 0.79 | TDP1 (0.41) | TP53ALDH1A1SMN1; SMN2AOC3TAAR1 | |
| SCHEMBL15734655 | 0.79 | POLB (0.40) | ALDH1A1AOC3TAAR1 | |
| SCHEMBL534257 | 0.78 | TP53 (0.42) | TP53TSHRALDH1A1SMN1; SMN2AOC3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 508 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | claimed |
| EP-2628745-B1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-03-25 | — | — | EP | claimed |
| JP-58188131-A | — | — | None | — | — | JP | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| EP-1598389-A1 | PROCESS FOR PRODUCING CATION-CURABLE SILICON COMPOUND | TOAGOSEI CO., LTD. (JP) | 2005-11-23 | — | — | EP | disclosed |
| EP-0700951-B1 | Polyorganosiloxane and process for producing the same | SHOWA DENKO KK (JP) | 2000-12-27 | — | — | EP | disclosed |
| US-5622784-A | WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM | SEIKO EPSON CORPORATION (JP) | 1997-04-22 | — | — | US | disclosed |
| EP-0700951-A1 | Polyorganosiloxane and process for producing the same | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1996-03-13 | — | — | EP | disclosed |
| US-5491203-A | COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS | SHOWA DENKO K. K. (JP) | 1996-02-13 | — | — | US | disclosed |
| US-4874728-A | DISPERSIBILITY | UNITED CATALYST INC. (US) | 1989-10-17 | — | — | US | disclosed |
| EP-0291787-A1 | Novel substituted silyl alkylene amines | MERRELL DOW PHARMACEUTICALS INC. (US) | 1988-11-23 | — | — | EP | disclosed |
| US-4469409-A | Homogeneous alignment layer for liquid crystal display device | HITACHI, LTD. (JP) | 1984-09-04 | — | — | US | disclosed |
| JP-S58188131-A | METHOD FOR ENHANCEMENT IN ADHESIVE PROPERTY BETWEEN RESIST AND SUBSTRATE | TOYO SODA MFG CO LTD | 1983-11-02 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | TP53 2101/4885TSHR 4084/4885ALDH1A1 3642/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | TP53 4706/4885TSHR 3614/4885ALDH1A1 1320/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | TP53 2594/4885TSHR 770/4885ALDH1A1 4452/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.