SCHEMBL10976271

SCHEMBL10976271

CCCCc1c(O)cc2ccccc2c1CCCC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.50
NPC1 O15118 1/20 0.50
MAPK1 P28482 1/20 0.50
HTT P42858 1/20 0.50
RAB9A P51151 1/20 0.50
NPSR1 Q6W5P4 1/20 0.50
NCEH1 Q6PIU2 1/20 0.49
TRPM4 Q8TD43 1/20 0.46
KDM4E B2RXH2 5/20 0.44
ALDH1A1 P00352 4/20 0.44
HSD17B10 Q99714 3/20 0.44
TDP1 Q9NUW8 2/20 0.44
MAPT P10636 2/20 0.44
PKM P14618 1/20 0.42
LMNA P02545 3/20 0.42
CYP1A2 P05177 2/20 0.42
ABCB11 O95342 1/20 0.42
CYP2D6 P10635 1/20 0.42
SCN1A P35498 1/20 0.42
SCN2A Q99250 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30689889 1.00 HPGD (0.50) HPGDNPC1MAPK1HTTRAB9A
SCHEMBL11221674 0.95 MAPT (0.47) HPGDNPC1MAPK1HTTRAB9A
SCHEMBL11225617 0.89 TRPM4 (0.48) HPGDNCEH1TRPM4KDM4EALDH1A1
SCHEMBL11024895 0.88 NCEH1 (0.45) HPGDNPC1MAPK1HTTRAB9A
SCHEMBL6545326 0.88 HPGD (0.47) HPGDNPC1MAPK1HTTRAB9A
SCHEMBL7915017 0.83 HTR2A (0.52) HPGDNPC1NCEH1KDM4EALDH1A1
SCHEMBL10933274 0.83 ALOX5 (0.49) HPGDTRPM4KDM4EALDH1A1HSD17B10
SCHEMBL8517831 0.83 HPGD (0.43) HPGDNPC1MAPK1HTTRAB9A
SCHEMBL21569596 0.82 NCEH1 (0.46) HPGDNPC1MAPK1HTTRAB9A
SCHEMBL28860671 0.82 SLC37A4 (0.51) HPGDNCEH1KDM4EALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117209343-A Continuous synthesis method of 2-naphthol compound 菏泽学院 2023-12-12 CN disclosed
EP-0068398-B1 THERMOPLASTIC MOULDING COMPOSITIONS BASED ON VINYL CHLORIDE POLYMERS AND IMPACT MODIFYING POLYMERS HOECHST AKTIENGESELLSCHAFT (DE) 1985-05-08 EP disclosed
EP-0043965-B1 PROCESS FOR PRODUCING STAMPINGS HAVING AN INCREASED WHITE FRACTURE EFFECT IN SHEETS OF VINYL CHLORIDE POLYMERS HOECHST AKTIENGESELLSCHAFT (DE) 1984-09-12 EP disclosed
US-4463119-A CONTAINING SOLID OR LIQUID POLYSILOXANES HOECHST AKTIENGESELLSCHAFT (DE) 1984-07-31 US disclosed
EP-0104433-A1 Moulded mass for extruding hollow bodies and profiles with an opaque surface HOECHST AKTIENGESELLSCHAFT (DE) 1984-04-04 EP disclosed
EP-0068398-A1 Thermoplastic moulding compositions based on vinyl chloride polymers and impact modifying polymers HOECHST AKTIENGESELLSCHAFT (DE) 1983-01-05 EP disclosed
US-4323714-A Alkylation of hydroxy-substituted aromatic compounds UOP INC. (US) 1982-04-06 US disclosed
EP-0043965-A1 Process for producing stampings having an increased white fracture effect in sheets of vinyl chloride polymers HOECHST AKTIENGESELLSCHAFT (DE) 1982-01-20 EP disclosed
US-4113679-A Antistatic thermoplastic molding compositions and shaped articles made therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1978-09-12 US disclosed
US-4082711-A COELASTOMER, PLASTICIZING HOECHST AKTIENGESELLSCHAFT (DT) 1978-04-04 US disclosed