SCHEMBL11153993

SCHEMBL11153993

COCCCNC(=O)c1ccc2c3ccc4c5c(ccc(c6ccc(C(=O)NCCCOC)c1c26)c53)C(=O)NC4=O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 8/20 0.47
▸ ALDH1A1 P00352 6/20 0.47
▸ KMT2A Q03164 5/20 0.47
▸ MEN1 O00255 3/20 0.47
▸ MAPT P10636 2/20 0.47
▸ MAPK1 P28482 2/20 0.47
▸ NPSR1 Q6W5P4 2/20 0.47
▸ APAF1 O14727 1/20 0.47
▸ NPC1 O15118 1/20 0.47
▸ RECQL P46063 1/20 0.47
▸ RAB9A P51151 1/20 0.47
▸ KEAP1 Q14145 1/20 0.47
▸ NFE2L2 Q16236 1/20 0.47
▸ TDP1 Q9NUW8 1/20 0.47
▸ HPGD P15428 5/20 0.45
▸ HSD17B10 Q99714 4/20 0.45
▸ SMN1; SMN2 Q16637 2/20 0.45
▸ TP53 P04637 1/20 0.41
▸ GAA P10253 2/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9511404 0.86 KDM4E (0.38) KDM4EALDH1A1KMT2AMEN1MAPT
SCHEMBL10641102 0.82 ALDH1A1 (0.54) KDM4EALDH1A1KMT2AMEN1MAPT
SCHEMBL11051768 0.77 KMT2A (0.36) KDM4EALDH1A1KMT2AMEN1MAPT
SCHEMBL1095842 0.74 ALOX5 (0.39) KDM4EALDH1A1MAPK1NPSR1HPGD
SCHEMBL2524404 0.74 ALOX5 (0.39) KDM4EALDH1A1MAPK1NPSR1HPGD
SCHEMBL11125145 0.74 KMT2A (0.39) KDM4EALDH1A1KMT2AMEN1MAPT
SCHEMBL5185602 0.72 CASP3 (0.35) KDM4EALDH1A1KMT2AMEN1MAPT
SCHEMBL6561059 0.70 HTT (0.39) KDM4EALDH1A1HSD17B10SMN1; SMN2HTT
SCHEMBL10893856 0.70 KMT2A (0.47) KDM4EKMT2AMEN1MAPTHPGD
SCHEMBL5187008 0.70 KMT2A (0.41) KDM4EALDH1A1KMT2AMEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4390609-A Electrophotographic recording material with abrasion resistant overcoat HOECHST AKTIENGESELLSCHAFT (DE) 1983-06-28 — — US disclosed
Send feedback