Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1C3 | P42330 | 2/20 | 0.48 |
| ▸ | POLB | P06746 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.45 |
| ▸ | ICAM1 | P05362 | 1/20 | 0.45 |
| ▸ | SELE | P16581 | 1/20 | 0.45 |
| ▸ | VCAM1 | P19320 | 1/20 | 0.45 |
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.44 |
| ▸ | SLC6A9 | P48067 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1127673 | 0.92 | SIRT1 (0.49) | AKR1C3POLBMEN1KMT2ATDP1 | |
| SCHEMBL2233495 | 0.92 | AKR1C3 (0.56) | AKR1C3POLBMEN1KMT2ATDP1 | |
| SCHEMBL1790331 | 0.84 | ALDH1A1 (0.53) | AKR1C3POLBMEN1KMT2ATDP1 | |
| SCHEMBL13134769 | 0.83 | ALDH1A1 (0.56) | AKR1C3POLBMEN1KMT2ATDP1 | |
| SCHEMBL9625444 | 0.81 | SIRT1 (0.56) | AKR1C3POLBMEN1KMT2ATDP1 | |
| SCHEMBL2129013 | 0.81 | SIRT1 (0.65) | AKR1C3POLBMEN1KMT2ATDP1 | |
| Acetophenone SCHEMBL28395442 | 0.80 | ALDH1A1 (0.59) | AKR1C3TDP1L3MBTL1SIRT1ALDH1A1 | |
| SCHEMBL28304795 | 0.80 | SIRT1 (0.51) | AKR1C3POLBMEN1KMT2ATDP1 | |
| SCHEMBL599930 | 0.79 | SIRT1 (0.50) | POLBTDP1L3MBTL1SIRT1ALDH1A1 | |
| SCHEMBL28682830 | 0.78 | SRD5A2 (0.55) | AKR1C3POLBMEN1KMT2ATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240160105-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-16 | — | — | US | disclosed |
| CN-112470551-B | Sealing agent for organic electroluminescent display element | 电化株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-113227159-B | Composition and method for producing the same | 电化株式会社 | 2024-04-19 | — | — | CN | disclosed |
| US-20240059831-A1 | CURABLE COMPOSITION AND CURED PRODUCT OF THE SAME, AND WAFER-LEVEL LENS | DAICEL CORPORATION (JP) | 2024-02-22 | — | — | US | disclosed |
| CN-117510794-A | Composition and method for producing the same | 电化株式会社 | 2024-02-06 | — | — | CN | disclosed |
| EP-4282895-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-29 | — | — | EP | disclosed |
| CN-113272383-B | Composition and method for producing the same | 电化株式会社 | 2023-11-17 | — | — | CN | disclosed |
| US-11809078-B2 | Photosensitive resin composition, dry film resist, and cured objects obtained therefrom | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2023-11-07 | — | — | US | disclosed |
| CN-116997858-A | Negative photosensitive resin composition, negative photosensitive resin composition film, cured product, method for producing cured product, hollow structure, and electronic component | 东丽株式会社 | 2023-11-03 | — | — | CN | disclosed |
| CN-113227169-B | Sealant, cured body, organic electroluminescent display device, and method for manufacturing device | 电化株式会社 | 2023-10-31 | — | — | CN | disclosed |
| EP-2284165-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | SAN APRO LTD (JP) | 2013-02-20 | — | — | EP | disclosed |
| US-20130037753-A1 | ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE | HITACHI CHEMICAL COMPANY, LTD (JP) | 2013-02-14 | — | — | US | disclosed |
| US-8278030-B2 | Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof | SAN-APRO LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| EP-2485290-A1 | MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE | Hitachi Chemical Company, Ltd. (JP) | 2012-08-08 | — | — | EP | disclosed |
| US-20120181530-A1 | MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE | RESONAC CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | SAN-APRO LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| EP-2284165-A1 | PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | San-Apro Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-7709598-B2 | Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex | SAN-APRO LIMITED (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | SAN-APRO LIMITED (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1752463-A1 | NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX | San-Apro Limited (JP) | 2007-02-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130037753-A1 | ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE | L1CAM, CD99, EPB41L2 | AKR1C3 3864/4885POLB 4284/4885MEN1 1526/4885 |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | ARSA, ASIC1, TST | AKR1C3 983/4885POLB 1211/4885MEN1 2080/4885 |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | AS3MT, TTR, PFAS | AKR1C3 3827/4885POLB 724/4885MEN1 697/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.