Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.49 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | NSD2 | O96028 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1127473 | 0.92 | AKR1C3 (0.48) | SIRT1AKR1C3MAPTGAATDP1 | |
| SCHEMBL9625444 | 0.85 | SIRT1 (0.56) | SIRT1AKR1C3MAPTGAATDP1 | |
| SCHEMBL2129013 | 0.85 | SIRT1 (0.65) | SIRT1AKR1C3MAPTGAATDP1 | |
| SCHEMBL28682830 | 0.83 | SRD5A2 (0.55) | SIRT1AKR1C3MAPTGAATDP1 | |
| SCHEMBL1128326 | 0.82 | ALDH1A1 (0.55) | MAPTTDP1ALDH1A1HPGDLMNA | |
| Acetophenone SCHEMBL28395442 | 0.81 | ALDH1A1 (0.59) | SIRT1AKR1C3MAPTGAATDP1 | |
| SCHEMBL2233495 | 0.81 | AKR1C3 (0.56) | SIRT1AKR1C3MAPTGAATDP1 | |
| SCHEMBL27641577 | 0.81 | SIRT1 (0.56) | SIRT1AKR1C3MAPTGAATDP1 | |
| SCHEMBL28304795 | 0.81 | SIRT1 (0.51) | SIRT1AKR1C3MAPTGAATDP1 | |
| SCHEMBL1127672 | 0.81 | SIRT1 (0.56) | SIRT1AKR1C3MAPTGAATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118284274-A | Charge-transporting varnish | 日产化学株式会社 | 2024-07-02 | — | — | CN | disclosed |
| US-20240176239-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, PREPARATION METHOD OF CURED PRODUCT, HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT | TORAY INDUSTRIES, INC. (JP) | 2024-05-30 | — | — | US | disclosed |
| US-20240160105-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-16 | — | — | US | disclosed |
| CN-112470551-B | Sealing agent for organic electroluminescent display element | 电化株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-113227159-B | Composition and method for producing the same | 电化株式会社 | 2024-04-19 | — | — | CN | disclosed |
| US-20240059831-A1 | CURABLE COMPOSITION AND CURED PRODUCT OF THE SAME, AND WAFER-LEVEL LENS | DAICEL CORPORATION (JP) | 2024-02-22 | — | — | US | disclosed |
| EP-4317240-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, PREPARATION METHOD OF CURED PRODUCT, HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT | Toray Industries, Inc. (JP) | 2024-02-07 | — | — | EP | disclosed |
| CN-117510794-A | Composition and method for producing the same | 电化株式会社 | 2024-02-06 | — | — | CN | disclosed |
| EP-4282895-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-29 | — | — | EP | disclosed |
| CN-113272383-B | Composition and method for producing the same | 电化株式会社 | 2023-11-17 | — | — | CN | disclosed |
| US-8278030-B2 | Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof | SAN-APRO LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| EP-2485290-A1 | MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE | Hitachi Chemical Company, Ltd. (JP) | 2012-08-08 | — | — | EP | disclosed |
| US-20120181530-A1 | MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE | RESONAC CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | SAN-APRO LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| EP-2284165-A1 | PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | San-Apro Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| EP-2239295-A2 | Radiation-curable silicone composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100255417-A1 | RADIATION-CURABLE SILICONE COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-07 | — | — | US | disclosed |
| US-7709598-B2 | Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex | SAN-APRO LIMITED (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | SAN-APRO LIMITED (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1752463-A1 | NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX | San-Apro Limited (JP) | 2007-02-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | ARSA, ASIC1, TST | SIRT1 1556/4885AKR1C3 983/4885MAPT 3867/4885 |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | AS3MT, TTR, PFAS | SIRT1 4238/4885AKR1C3 3827/4885MAPT 641/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.