Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | KCNK3 | O14649 | 1/20 | 0.36 |
| ▸ | KCNK9 | Q9NPC2 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.35 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.35 |
| ▸ | WNT3A | P56704 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11757375 | 0.86 | AKR1C3 (0.44) | ALDH1A1SMN1; SMN2NPC1RAB9AMEN1 | |
| SCHEMBL31613189 | 0.86 | AKR1C3 (0.44) | ALDH1A1SMN1; SMN2NPC1RAB9AMEN1 | |
| SCHEMBL11757827 | 0.85 | ALDH1A1 (0.49) | ALDH1A1SMN1; SMN2NPC1RAB9AMAPT | |
| SCHEMBL1127935 | 0.82 | ALDH1A1 (0.37) | ALDH1A1SMN1; SMN2NPC1RAB9AHTT | |
| SCHEMBL8256708 | 0.80 | TSHR (0.47) | ALDH1A1SMN1; SMN2NPC1RAB9AHTT | |
| SCHEMBL3281845 | 0.77 | LMNA (0.42) | ALDH1A1SMN1; SMN2NPC1RAB9AMEN1 | |
| SCHEMBL20546806 | 0.74 | KMT2A (0.48) | ALDH1A1SMN1; SMN2NPC1RAB9AMEN1 | |
| SCHEMBL30717265 | 0.74 | CES2 (0.56) | ALDH1A1SMN1; SMN2NPC1RAB9AMEN1 | |
| SCHEMBL28586350 | 0.72 | MEN1 (0.42) | ALDH1A1SMN1; SMN2HTTMEN1KMT2A | |
| SCHEMBL1127542 | 0.72 | ALDH1A1 (0.44) | ALDH1A1SMN1; SMN2NPC1RAB9AHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12024579-B2 | Curable liquid composition, particulate filler, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-07-02 | — | — | US | disclosed |
| CN-112470551-B | Sealing agent for organic electroluminescent display element | 电化株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-113227159-B | Composition and method for producing the same | 电化株式会社 | 2024-04-19 | — | — | CN | disclosed |
| US-20240045330-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-117510794-A | Composition and method for producing the same | 电化株式会社 | 2024-02-06 | — | — | CN | disclosed |
| CN-113272383-B | Composition and method for producing the same | 电化株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-113227169-B | Sealant, cured body, organic electroluminescent display device, and method for manufacturing device | 电化株式会社 | 2023-10-31 | — | — | CN | disclosed |
| US-20230236505-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM | SAN-APRO LTD. (JP) | 2023-07-27 | — | — | US | disclosed |
| CN-116018558-A | Negative photosensitive resin composition, pattern forming method and laminated film | 三亚普罗股份有限公司 | 2023-04-25 | — | — | CN | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-8278030-B2 | Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof | SAN-APRO LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| EP-2399905-A1 | SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION | San-Apro Limited (JP) | 2011-12-28 | — | — | EP | disclosed |
| US-20110300482-A1 | SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION | SAN-APRO, LTD (JP) | 2011-12-08 | — | — | US | disclosed |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | SAN-APRO LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| EP-2284165-A1 | PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | San-Apro Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-7709598-B2 | Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex | SAN-APRO LIMITED (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20090163723-A1 | METHOD FOR PRODUCING SULFONIUM FLUORINATED ALKYLFLUOROPHOSPHATE | SAN-APRO LIMITED (JP) | 2009-06-25 | — | — | US | disclosed |
| EP-1953139-A1 | METHOD FOR PRODUCING FLUORINATED SULFONIUM ALKYLFLUOROPHOSPHATE | San-Apro Ltd. (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | SAN-APRO LIMITED (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1752463-A1 | NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX | San-Apro Limited (JP) | 2007-02-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090163723-A1 | METHOD FOR PRODUCING SULFONIUM FLUORINATED ALKYLFLUOROPHOSPHATE | ARSA, SCO2, DOHH | ALDH1A1 1481/4885SMN1; SMN2 2307/4885NPC1 701/4885 |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | ARSA, ASIC1, TST | ALDH1A1 1574/4885SMN1; SMN2 1788/4885NPC1 4053/4885 |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | AS3MT, TTR, PFAS | ALDH1A1 3745/4885SMN1; SMN2 297/4885NPC1 4337/4885 |
| US-20110300482-A1 | SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION | ASIC1, H1-0, IK | ALDH1A1 2140/4885SMN1; SMN2 2221/4885NPC1 3382/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.