Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK13 | O15264 | 10/20 | 0.67 |
| ▸ | MAPK12 | P53778 | 10/20 | 0.67 |
| ▸ | MAPK11 | Q15759 | 10/20 | 0.67 |
| ▸ | MAPK14 | Q16539 | 10/20 | 0.67 |
| ▸ | GCGR | P47871 | 5/20 | 0.67 |
| ▸ | ALOX5 | P09917 | 4/20 | 0.67 |
| ▸ | MAPK9 | P45984 | 2/20 | 0.67 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.67 |
| ▸ | MAP4K4 | O95819 | 1/20 | 0.67 |
| ▸ | LCK | P06239 | 1/20 | 0.67 |
| ▸ | RET | P07949 | 1/20 | 0.67 |
| ▸ | PRKACA | P17612 | 1/20 | 0.67 |
| ▸ | RPS6KB1 | P23443 | 1/20 | 0.67 |
| ▸ | MATK | P42679 | 1/20 | 0.67 |
| ▸ | FRK | P42685 | 1/20 | 0.67 |
| ▸ | CSNK1A1 | P48729 | 1/20 | 0.67 |
| ▸ | CSNK1D | P48730 | 1/20 | 0.67 |
| ▸ | GSK3A | P49840 | 1/20 | 0.67 |
| ▸ | GSK3B | P49841 | 1/20 | 0.67 |
| ▸ | CSNK1G2 | P78368 | 1/20 | 0.67 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6468970 | 0.93 | MAPK13 (0.79) | MAPK13MAPK12MAPK11MAPK14GCGR | |
| SCHEMBL20504148 | 0.88 | MAPK13 (0.67) | MAPK13MAPK12MAPK11MAPK14GCGR | |
| SCHEMBL5074753 | 0.87 | MAPK13 (0.83) | MAPK13MAPK12MAPK11MAPK14GCGR | |
| SCHEMBL6469124 | 0.86 | MAPK13 (0.68) | MAPK13MAPK12MAPK11MAPK14GCGR | |
| SCHEMBL16667652 | 0.85 | MAPK13 (0.83) | MAPK13MAPK12MAPK11MAPK14GCGR | |
| Benzene SCHEMBL28852698 | 0.85 | MAPK13 (0.82) | MAPK13MAPK12MAPK11MAPK14GCGR | |
| SCHEMBL104130 | 0.85 | MAPK13 (0.82) | MAPK13MAPK12MAPK11MAPK14GCGR | |
| Methane SCHEMBL3278320 | 0.83 | MAPK13 (0.79) | MAPK13MAPK12MAPK11MAPK14GCGR | |
| SCHEMBL27850480 | 0.83 | MAPK13 (0.79) | MAPK13MAPK12MAPK11MAPK14GCGR | |
| SCHEMBL23710761 | 0.82 | KDM4E (0.78) | MAPK13MAPK12MAPK11MAPK14GCGR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 290 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-21 | — | — | US | disclosed |
| CN-122028714-A | Method for manufacturing semiconductor device and composition for coating patterned photoresist | 台湾积体电路制造股份有限公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-07 | — | — | US | disclosed |
| US-12619148-B2 | Crosslinkable photoresist for extreme ultraviolet lithography | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-05-05 | — | — | US | disclosed |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-16 | — | — | US | disclosed |
| US-20260101726-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-09 | — | — | US | disclosed |
| US-12578645-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-17 | — | — | US | disclosed |
| US-20260076154-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-12 | — | — | US | disclosed |
| EP-4704757-A1 | SEMICRYSTALLINE SULFUR CONTAINING POLYMERS FOR ORTHODONTIC APPLICATIONS | Align Technology, Inc. (US) | 2026-03-11 | — | — | EP | disclosed |
| US-12566374-B2 | Photoresist composition and method of manufacturing semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-03 | — | — | US | disclosed |
| US-20070225467-A1 | Polyurethane polymer having bisphenol group and photoimageable composition containing the same | ETERNAL MATERIALS CO., LTD. (TW) | 2007-09-27 | — | — | US | disclosed |
| CN-101024624-A | Oxime derivative, photopolymerisable composition, colour filter and process for producing the same | FUJIFILM CORP (JP) | 2007-08-29 | — | — | CN | disclosed |
| CN-1332266-C | Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed circuit board | HITACHI CHEMICAL CO LTD (JP) | 2007-08-15 | — | — | CN | disclosed |
| US-20060058472-A1 | Functionalized polymer | SHIPLEY COMPANY, L.L.C. (US) | 2006-03-16 | — | — | US | disclosed |
| US-20040224259-A1 | Functionalized polymer | SHIPLEY COMPANY, L.L.C. | 2004-11-11 | — | — | US | disclosed |
| EP-1440348-A1 | UV CURABLE POWDER SUITABLE FOR USE AS PHOTORESIST | DSM IP Assets B.V. (NL) | 2004-07-28 | — | — | EP | disclosed |
| EP-1429184-A1 | Functionalized copolymer for photopolymerizable composition | Shipley Company, L.L.C. (US) | 2004-06-16 | — | — | EP | disclosed |
| US-20030170568-A1 | UV curable powder suitable for use as a photoresist | DSM IP ASSETS B.V. (NL) | 2003-09-11 | — | — | US | disclosed |
| WO-2003038527-A1 | UV CURABLE POWDER SUITABLE FOR USE AS PHOTORESIST | DSM IP ASSETS B.V. (NL) | 2003-05-08 | — | — | WO | disclosed |
| CN-1342273-A | Photosensitive resin composition, photosensitive element using the same, method for producing etched pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2002-03-27 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | INO80C, INO80, NAT10 | MAPK13 2287/4885MAPK12 3431/4885MAPK11 1723/4885 |
| US-20260076154-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | JUP, DSG1, ATM | MAPK13 1301/4885MAPK12 2229/4885MAPK11 2311/4885 |
| US-12578645-B2 | Method of manufacturing a semiconductor device | SUN2, MYB, NONO | MAPK13 1805/4885MAPK12 1911/4885MAPK11 2709/4885 |
| US-20260101726-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL | PIEZO1, MYB, MAP2K4 | MAPK13 331/4885MAPK12 644/4885MAPK11 898/4885 |
| US-12566374-B2 | Photoresist composition and method of manufacturing semiconductor device | INO80C, INO80, PI4K2B | MAPK13 2233/4885MAPK12 3534/4885MAPK11 2052/4885 |
| US-12619148-B2 | Crosslinkable photoresist for extreme ultraviolet lithography | LBR, ARCN1, ERCC1 | MAPK13 4115/4885MAPK12 4686/4885MAPK11 4155/4885 |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | C9, C1S, ZKSCAN2 | MAPK13 3043/4885MAPK12 3070/4885MAPK11 2278/4885 |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | DSTN, PFAS, DNTT | MAPK13 3161/4885MAPK12 3805/4885MAPK11 2321/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.