Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | NR1H2 | P55055 | 6/20 | 0.37 |
| ▸ | NR1H3 | Q13133 | 6/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.32 |
| ▸ | AR | P10275 | 1/20 | 0.31 |
| ▸ | NQO2 | P16083 | 1/20 | 0.31 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.30 |
| ▸ | PGK1 | P00558 | 1/20 | 0.30 |
| ▸ | PGK2 | P07205 | 1/20 | 0.30 |
| ▸ | ESR1 | P03372 | 1/20 | 0.30 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL476554 | 0.83 | ALDH1A1 (0.52) | ALDH1A1TSHRNR1H2NR1H3TDP1 | |
| SCHEMBL16626146 | 0.83 | ALDH1A1 (0.58) | ALDH1A1TSHRNR1H2NR1H3TDP1 | |
| SCHEMBL1284428 | 0.82 | PGK1 (0.40) | ALDH1A1TSHRNR1H2NR1H3PGK1 | |
| SCHEMBL643498 | 0.79 | NR1H2 (0.56) | ALDH1A1NR1H2NR1H3 | |
| SCHEMBL476546 | 0.79 | ALDH1A1 (0.48) | ALDH1A1TSHRNR1H2NR1H3TDP1 | |
| SCHEMBL16626142 | 0.79 | ALDH1A1 (0.54) | ALDH1A1TSHRTDP1HDAC8CA1 | |
| SCHEMBL5662892 | 0.78 | TP53 (0.40) | ALDH1A1TSHRTDP1PGK1PGK2 | |
| SCHEMBL21066247 | 0.78 | ALDH1A1 (0.46) | ALDH1A1TSHRNR1H2NR1H3TDP1 | |
| Styrene SCHEMBL4917329 | 0.77 | ALDH1A1 (0.64) | ALDH1A1TSHRNR1H2NR1H3TDP1 | |
| SCHEMBL16626135 | 0.77 | ALDH1A1 (0.50) | ALDH1A1TSHRCYP1A2PTGS1NQO2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113122227-A | Composite material, preparation method thereof, light-emitting film and display device | TCL集团股份有限公司 | 2021-07-16 | — | — | CN | claimed |
| JP-1293337-A | — | — | None | — | — | JP | disclosed |
| JP-2120355-A | — | — | None | — | — | JP | disclosed |
| JP-2120354-A | — | — | None | — | — | JP | disclosed |
| JP-2120356-A | — | — | None | — | — | JP | disclosed |
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117590691-A | Photosensitive resin composition | 中央硝子株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-117321109-A | Phenolic hydroxyl group-containing resin | DIC株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-116209690-A | Phenolic hydroxyl group-containing resin, resin composition for alkali-developable resist, resist-curable resin composition, and method for producing phenolic hydroxyl group-containing resin | DIC株式会社 | 2023-06-02 | — | — | CN | disclosed |
| CN-115873214-A | Epoxy resin, photosensitive resin composition, resist film, curable composition, and cured film | DIC株式会社 | 2023-03-31 | — | — | CN | disclosed |
| US-7951525-B2 | Low outgassing photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-05-31 | — | — | US | disclosed |
| EP-2285845-A1 | LOW OUTGASSING PHOTORESIST COMPOSITIONS | International Business Machines Corporation (US) | 2011-02-23 | — | — | EP | disclosed |
| US-20100062368-A1 | LOW OUTGASSING PHOTORESIST COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-03-11 | — | — | US | disclosed |
| WO-2010025983-A1 | LOW OUTGASSING PHOTORESIST COMPOSITIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-03-11 | — | — | WO | disclosed |
| US-6943271-B2 | Process for producing fluorine-containing, polymerizable styrene monomer and intermediates used in same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-09-13 | — | — | US | disclosed |
| US-20040002612-A1 | Process for producing fluorine-containing, polymerizable styrene monomer and intermediates used in same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-01-01 | — | — | US | disclosed |
| JP-H02120354-A | RESIN COMPOSITION FOR OPTICAL MATERIAL | TOSOH CORP | 1990-05-08 | — | — | JP | disclosed |
| JP-H02120355-A | RESIN COMPOSITION FOR OPTICAL MATERIAL | TOSOH CORP | 1990-05-08 | — | — | JP | disclosed |
| JP-H02120356-A | RESIN COMPOSITION FOR OPTICAL MATERIAL | TOSOH CORP | 1990-05-08 | — | — | JP | disclosed |
| JP-H01293337-A | NEGATIVE TYPE PHOTORESIST COMPOSITION | TOSOH CORP | 1989-11-27 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040002612-A1 | Process for producing fluorine-containing, polymerizable styrene monomer and intermediates used in same | PFAS, AFF1, AFF2 | ALDH1A1 1392/4885TSHR 2096/4885NR1H2 4260/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.