SCHEMBL1137422

SCHEMBL1137422

C=C(CCc1cccc(O)c1)C(=O)O

nearest known ligand 0.53

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ DRD2 P14416 2/20 0.50
▸ DRD1 P21728 1/20 0.50
▸ TAAR1 Q96RJ0 1/20 0.50
▸ IDO1 P14902 1/20 0.49
▸ HDAC6 Q9UBN7 1/20 0.49
▸ CTBP2 P56545 1/20 0.49
▸ OPRK1 P41145 5/20 0.49
▸ CHRM2 P08172 2/20 0.46
▸ CHRM1 P11229 2/20 0.46
▸ CHRM3 P20309 2/20 0.46
▸ OPRM1 P35372 4/20 0.45
▸ OPRD1 P41143 4/20 0.45
▸ FFAR1 O14842 1/20 0.44
▸ ENPP2 Q13822 1/20 0.44
▸ TYR P14679 1/20 0.43
▸ SPR P35270 1/20 0.43
▸ MGLL Q99685 1/20 0.43
▸ DRD3 P35462 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1137526 0.90 HDAC6 (0.54) DRD2DRD1TAAR1IDO1HDAC6
SCHEMBL17975817 0.84 FFAR1 (0.53) HDAC6FFAR1
SCHEMBL1137221 0.82 CTBP2 (0.60) DRD2DRD1TAAR1IDO1CTBP2
SCHEMBL65250 0.82 KEAP1 (0.63) DRD2DRD1TAAR1IDO1HDAC6
SCHEMBL31336237 0.82 KEAP1 (0.63) DRD2DRD1TAAR1IDO1HDAC6
SCHEMBL13176544 0.82 DRD2 (0.57) DRD2DRD1TAAR1IDO1HDAC6
SCHEMBL29563859 0.82 KEAP1 (0.63) DRD2DRD1TAAR1IDO1HDAC6
SCHEMBL1920986 0.81 FFAR1 (0.50) FFAR1
SCHEMBL1921167 0.81 CTBP2 (0.50) TAAR1HDAC6CTBP2FFAR1
SCHEMBL1919956 0.81 PLAAT3 (0.54) TAAR1CTBP2FFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1038668-B1 Photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO LTD (JP) 2005-05-25 — — EP claimed
EP-0914964-B1 Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO LTD (JP) 2004-12-29 — — EP claimed
CN-111295291-B Security element and security system 富士胶片株式会社 2021-05-07 — — CN disclosed
CN-111601705-A Laminate, composite, and method for producing composite 富士胶片株式会社 2020-08-28 — — CN disclosed
CN-111295291-A Security element and security system 富士胶片株式会社 2020-06-16 — — CN disclosed
EP-2042310-B1 Planographic printing plate precursor FUJIFILM CORP (JP) 2016-08-17 — — EP disclosed
EP-2641738-B1 Planographic printing plate precursor and method for producing a planographic printing plate FUJIFILM CORP (JP) 2016-01-20 — — EP disclosed
EP-2080616-B1 Planographic printing plate precursor FUJIFILM CORP (JP) 2013-11-27 — — EP disclosed
EP-2106907-B1 Planographic printing plate precursor FUJIFILM CORP (JP) 2013-10-16 — — EP disclosed
EP-2641738-A2 Method of producing planographic printing plate and planographic printing plate Fujifilm Corporation (JP) 2013-09-25 — — EP disclosed
EP-1403716-B1 Process for developing lithographic printing plate FUJIFILM CORP (JP) 2013-01-16 — — EP disclosed
US-6410203-B1 WATER INSOLUBLE POLYMER AND INFRARED ABSORBER FUJI PHOTO FILM CO., LTD. (JP) 2002-06-25 — — US disclosed
EP-1162063-A2 Planographic printing plate precursor Fuji Photo Film Co., Ltd. (JP) 2001-12-12 — — EP disclosed
EP-1157854-A2 Support for lithographic printing plate and presensitized plate FUJI PHOTO FILM CO., LTD. (JP) 2001-11-28 — — EP disclosed
EP-1120246-A2 Planographic printing original plate and method of plate-making a planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2001-08-01 — — EP disclosed
EP-1053999-A2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-11-22 — — EP disclosed
EP-0571330-B1 High-resolution photoresist with enhanced sensitivity for I-line exposure CIBA GEIGY AG (CH) 1999-04-07 — — EP disclosed
US-5759740-A High resolution i-line photoresist of high sensitivity CIBA SPECIALTY CHEMICALS CORPORATION (US) 1998-06-02 — — US disclosed
US-5627011-A High resolution i-line photoresist of high sensitivity CIBA-GEIGY CORPORATION (US) 1997-05-06 — — US disclosed
EP-0571330-A1 High-resolution photoresist with enhanced sensitivity for I-line exposure CIBA-GEIGY AG (CH) 1993-11-24 — — EP disclosed
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