Phosphonic Acid

Phosphonic Acid

SCHEMBL1167665

O=[PH]([O-])[O-].[H+].[Na+]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Phosphonic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112979894-B Cationic block polymer intercalation modifier, preparation method thereof and application thereof in building functional materials 中国国家铁路集团有限公司 2023-03-14 CN claimed
WO-2024181357-A1 METHOD FOR PRODUCING TONER, AND TONER 日本ゼオン株式会社 2024-09-06 WO disclosed
EP-3802038-B1 SEPARATION FLUID, METHOD AND APPARATUS FOR RECYCLING MULTILAYER MATERIAL USING A PASSIVATION AGENT saperatec GmbH (DE) 2024-07-17 EP disclosed
CN-112979894-B Cationic block polymer intercalation modifier, preparation method thereof and application thereof in building functional materials 中国国家铁路集团有限公司 2023-03-14 CN disclosed
WO-2021150256-A1 FULLERENE PHOSPHONATES, METHOD, AND MEDICAMENT BUTZLOFF PETER ROBERT (US) 2021-07-29 WO disclosed
US-20210086406-A1 SEPARATION FLUID, METHOD AND APPARATUS FOR RECYCLING MULTILAYER MATERIAL USING A PASSIVATION AGENT saperatec GmbH (DE) 2021-03-25 US disclosed
US-7888300-B2 Comprising a reducing agent and cationic surfactants of a quaternary ammonium salt and an alkylpyridium surfactant; high-speed,low-temperature removal of deposits from a photoresist, an antireflective film; etching/ashing residues; environmentally friendly; corrosion resistance FUJIFILM CORPORATION (JP) 2011-02-15 US disclosed
EP-1454922-B1 METHOD OF STRIPPING VOLATILE SUBSTANCE FROM POLYMER PARTICLE DISPERSION AND PROCESS FOR PRODUCING TONER ZEON CORP (JP) 2010-10-13 EP disclosed
US-20100160200-A1 Cleaning liquid for semiconductor device and cleaning method FUJIFILM CORPORATION (JP) 2010-06-24 US disclosed
US-20100069532-A1 PROCESS FOR PREPARING POLYMERIZABLE CARBOXYLIC ESTERS WITH ALKOXY GROUPS BASF SE (DE) 2010-03-18 US disclosed
US-7304124-B2 Process for stripping volatile substances from dispersion comprising polymer particles and process for producing toner ZEON CORPORATION (JP) 2007-12-04 US disclosed
US-20050176925-A1 Method of stripping volatile substance from polymer particle dispersion and process for producing toner ZEON CORPORATION (JP) 2005-08-11 US disclosed
EP-1454922-A1 METHOD OF STRIPPING VOLATILE SUBSTANCE FROM POLYMER PARTICLE DISPERSION AND PROCESS FOR PRODUCING TONER Zeon Corporation (JP) 2004-09-08 EP disclosed
US-20020132946-A1 Use of polymers containing carboxyl groups and polyalkylene ether side chains as additives in mineral building materials BASF AKTIENGESSELLSCHAFT (DE) 2002-09-19 US disclosed
US-20020055559-A1 Prepared in the presence of phosphorus-containing compounds such as phosphinic acid, phosphonic acid and the salts of these. BASF AKTIENGESELLSCHAFT (DE) 2002-05-09 US disclosed
US-6384111-B1 Prepared in the presence of phosphorus-containing compounds such as phosphinic acid, phosphonic acid and the salts of these. BASF AKTIENGESELLSCHAFT (DE) 2002-05-07 US disclosed