SCHEMBL11921094

SCHEMBL11921094

C=CCn1c2ccccc2c2cc([S+]3CCCC3)ccc21

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 3/20 0.41
▸ ATM Q13315 3/20 0.41
▸ RAB9A P51151 3/20 0.41
▸ KMT2A Q03164 4/20 0.39
▸ MEN1 O00255 3/20 0.39
▸ POLB P06746 1/20 0.39
▸ ALDH1A1 P00352 3/20 0.39
▸ HPGD P15428 2/20 0.39
▸ HTT P42858 2/20 0.39
▸ PTGER4 P35408 6/20 0.39
▸ HCRTR1 O43613 2/20 0.38
▸ L3MBTL1 Q9Y468 2/20 0.38
▸ CASP3 P42574 1/20 0.38
▸ SENP8 Q96LD8 1/20 0.38
▸ SENP7 Q9BQF6 1/20 0.38
▸ SENP6 Q9GZR1 1/20 0.38
▸ ALPL P05186 1/20 0.36
▸ GAA P10253 1/20 0.36
▸ RXFP1 Q9HBX9 1/20 0.36
▸ MAPT P10636 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921067 0.82 MAPT (0.55) KMT2AMEN1POLBALDH1A1HPGD
SCHEMBL11921068 0.82 KDM4E (0.33) KMT2AMEN1ALDH1A1HPGDHTT
SCHEMBL11921083 0.78 RORA (0.41) KMT2AMEN1ALDH1A1HPGDHTT
SCHEMBL11921090 0.78 ALDH1A1 (0.41) NPC1KMT2AMEN1POLBALDH1A1
SCHEMBL553110 0.77 ALDH1A1 (0.49) NPC1ATMRAB9AKMT2AMEN1
SCHEMBL146503 0.77 CYP1A2 (0.56) NPC1RAB9AKMT2AMEN1POLB
SCHEMBL4604142 0.76 PTGER4 (0.50) NPC1ATMRAB9AKMT2AMEN1
SCHEMBL30874765 0.76 PTGER4 (0.50) NPC1ATMRAB9AKMT2AMEN1
SCHEMBL11921095 0.74 L3MBTL1 (0.55) ATMKMT2AMEN1POLBALDH1A1
SCHEMBL9403852 0.74 MAPT (0.55) NPC1ATMRAB9AKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846293-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
US-20120251948-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-04 — — US disclosed
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
Send feedback