Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | P2RX4 | Q99571 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 2/20 | 0.51 |
| ▸ | MAPT | P10636 | 2/20 | 0.51 |
| ▸ | HTT | P42858 | 2/20 | 0.51 |
| ▸ | SRC | P12931 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | AGTR1 | P30556 | 4/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | IDO1 | P14902 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11921069 | 0.84 | POLB (0.58) | LMNAMAPTHTTMEN1ALDH1A1 | |
| SCHEMBL11921099 | 0.81 | POLB (0.40) | LMNAMAPTHTTMEN1ALDH1A1 | |
| SCHEMBL11921098 | 0.81 | MCHR2 (0.45) | LMNAMAPTHTTMEN1ALDH1A1 | |
| SCHEMBL11921095 | 0.79 | L3MBTL1 (0.55) | LMNAMAPTHTTMEN1ALDH1A1 | |
| SCHEMBL872109 | 0.78 | P2RX4 (0.81) | P2RX4LMNAMAPTHTTSRC | |
| SCHEMBL12034344 | 0.75 | P2RX4 (0.61) | P2RX4LMNAMAPTHTTSRC | |
| SCHEMBL7980221 | 0.73 | SRC (0.87) | P2RX4LMNAMAPTHTTSRC | |
| SCHEMBL12034343 | 0.71 | P2RX4 (0.56) | P2RX4LMNAMAPTHTTSRC | |
| SCHEMBL11921115 | 0.71 | KDM4E (0.54) | LMNAMAPTHTTMEN1ALDH1A1 | |
| SCHEMBL12034361 | 0.70 | P2RX4 (0.55) | P2RX4LMNAMAPTHTTSRC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8846293-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20120251948-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20120207978-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-16 | — | — | US | disclosed |