Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 3/20 | 0.40 |
| ▸ | LMNA | P02545 | 4/20 | 0.39 |
| ▸ | MAPT | P10636 | 3/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | RAD52 | P43351 | 1/20 | 0.35 |
| ▸ | NPY5R | Q15761 | 4/20 | 0.35 |
| ▸ | MCHR2 | Q969V1 | 1/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11921069 | 0.85 | POLB (0.58) | POLBLMNAMAPTHTTKDM4E | |
| SCHEMBL11921098 | 0.82 | MCHR2 (0.45) | POLBLMNAMAPTHTTKDM4E | |
| SCHEMBL11921096 | 0.81 | P2RX4 (0.52) | POLBLMNAMAPTHTTKDM4E | |
| SCHEMBL11921095 | 0.75 | L3MBTL1 (0.55) | POLBLMNAMAPTHTTKDM4E | |
| SCHEMBL11921067 | 0.74 | MAPT (0.55) | POLBLMNAMAPTHTTKDM4E | |
| SCHEMBL11921115 | 0.72 | KDM4E (0.54) | LMNAMAPTHTTKDM4EALDH1A1 | |
| SCHEMBL11921068 | 0.71 | KDM4E (0.33) | MAPTHTTKDM4EALDH1A1HPGD | |
| SCHEMBL2483599 | 0.69 | KDM4E (0.54) | POLBLMNAMAPTHTTKDM4E | |
| SCHEMBL11921090 | 0.68 | ALDH1A1 (0.41) | POLBLMNAMAPTHTTKDM4E | |
| SCHEMBL11921083 | 0.68 | RORA (0.41) | LMNAMAPTHTTKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8846293-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20120251948-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20120207978-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-16 | — | — | US | disclosed |