SCHEMBL12014396

SCHEMBL12014396

O=C1OCCC1CN1CCOCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 1/20 0.41
DRD2 P14416 1/20 0.41
ADRA2B P18089 1/20 0.41
ADRA2C P18825 1/20 0.41
DRD1 P21728 1/20 0.41
HTR2A P28223 1/20 0.41
HTR7 P34969 1/20 0.41
ADRA1A P35348 1/20 0.41
DRD3 P35462 1/20 0.41
OPRD1 P41143 1/20 0.41
HTR2B P41595 1/20 0.41
LMNA P02545 3/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C19 P33261 1/20 0.40
BLM P54132 1/20 0.40
HSP90AA1 P07900 1/20 0.39
CCR6 P51684 1/20 0.39
GAA P10253 3/20 0.37
KCNH3 Q9ULD8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL65466 0.87 METAP1 (0.38) ADRA2AADRA2BADRA2CADRA1AKCNH3
SCHEMBL12014397 0.85 ADRA2C (0.41) ADRA2AADRA2BADRA2CADRA1AKCNH3
SCHEMBL31708223 0.80 KCNH3 (0.32) KCNH3
SCHEMBL5344773 0.73 ADRA2A (0.43) ADRA2ADRD2ADRA2BADRA2CDRD1
SCHEMBL5593793 0.71 ADRA2A (0.42) ADRA2ADRD2ADRA2BADRA2CDRD1
SCHEMBL9818144 0.71 KCNH3 (0.38) KCNH3
SCHEMBL26457234 0.68 ATM (0.38) KDM4EALDH1A1DAOTSHRSMN1; SMN2
SCHEMBL13238753 0.68 ALDH1A1 (0.41) ADRA2ADRD2ADRA2BADRA2CDRD1
SCHEMBL24996046 0.67
SCHEMBL10907196 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8728707-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-05-20 US disclosed
US-8728707-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-05-20 US disclosed
US-8568956-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-10-29 US disclosed
US-8568956-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-10-29 US disclosed
US-20130022909-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-01-24 US disclosed
US-20130022909-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-01-24 US disclosed
US-20120219899-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-30 US disclosed
US-20120219899-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-30 US disclosed