Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 6/20 | 0.48 |
| ▸ | CPA1 | P15085 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | GRB2 | P62993 | 1/20 | 0.38 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.37 |
| ▸ | FAAH | O00519 | 3/20 | 0.36 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoroacetic Acid SCHEMBL107133 | 0.86 | CES1 (0.45) | CES1CPA1PTPN1FAAHHDAC6 | |
| SCHEMBL2436976 | 0.82 | TSHR (0.43) | CES1PTPN1 | |
| SCHEMBL4964687 | 0.80 | CES1 (0.39) | CES1PTPN1HDAC6MEN1MAPT | |
| Oxalic Acid SCHEMBL12231034 | 0.79 | CES2 (0.41) | CES1MAPT | |
| SCHEMBL2437783 | 0.79 | TSHR (0.41) | CES1PTPN1 | |
| Acetic Acid SCHEMBL7788632 | 0.79 | CES2 (0.46) | CES1MAPT | |
| SCHEMBL1634799 | 0.78 | ALDH1A1 (0.38) | CES1CYP1A2PTPN1MEN1HTT | |
| Trifluoromethanesulfonic Acid SCHEMBL759937 | 0.77 | PTPN1 (0.41) | CES1PTPN1FAAH | |
| Bicarbonate SCHEMBL105290 | 0.77 | CA2 (0.46) | CES1HDAC6MAPT | |
| Bicarbonate SCHEMBL105292 | 0.77 | CA2 (0.46) | CES1HDAC6MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11630390-B2 | Negative type photosensitive composition curable at low temperature | MERCK PATENT GMBH (DE) | 2023-04-18 | — | — | US | disclosed |
| CN-108700814-B | Low-temperature curable negative photosensitive composition | AZ电子材料（卢森堡）有限公司 | 2022-10-11 | — | — | CN | disclosed |
| US-20210208503-A1 | NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE | RIDGEFIELD ACQUISITION (LU) | 2021-07-08 | — | — | US | disclosed |
| CN-110494807-A | The resist lower membrane formation composition containing silicon with carbonyl structure | NISSAN CHEMICAL CORP | 2019-11-22 | — | — | CN | disclosed |
| CN-103988127-B | Photosensitive resin composition, method for producing cured relief pattern, semiconductor device, and display device | 旭化成株式会社 | 2019-04-19 | — | — | CN | disclosed |
| CN-108700814-A | The negative photosensitive composition of low-temperature curable | AZ电子材料（卢森堡）有限公司 | 2018-10-23 | — | — | CN | disclosed |
| EP-2500775-B1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHINETSU CHEMICAL CO (JP) | 2018-01-03 | — | — | EP | disclosed |
| CN-107329367-A | Photosensitive resin composition, method for producing cured relief pattern, semiconductor device, and display device | 旭化成株式会社 | 2017-11-07 | — | — | CN | disclosed |
| CN-106406028-A | Photosensitized Composite, Solidified Film, Liquid Crystal Displaying Device, Organic Electrophotographic Light-Emitting Display Device and Method for Producing Masked Surface Plate | 富士胶片株式会社 | 2017-02-15 | — | — | CN | disclosed |
| CN-106324986-A | A photosensitive resin composition, a method for producing a cured film, a cured film, and a liquid crystal display device | 富士胶片株式会社 | 2017-01-11 | — | — | CN | disclosed |
| US-8951711-B2 | Patterning process and composition for forming silicon-containing film usable therefor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-10 | — | — | US | disclosed |
| US-20140342289-A1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8835102-B2 | Patterning process and composition for forming silicon-containing film usable therefor | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-20120238095-A1 | PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-09-20 | — | — | US | disclosed |
| EP-2500775-A2 | Patterning process and composition for forming silicon-containing film usable therefor | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-09-19 | — | — | EP | disclosed |