Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 1/20 | 0.38 |
| ▸ | AGXT | P21549 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | MAOA | P21397 | 2/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | MC4R | P32245 | 1/20 | 0.36 |
| ▸ | MC5R | P33032 | 1/20 | 0.36 |
| ▸ | HTR1A | P08908 | 2/20 | 0.36 |
| ▸ | ADRA1D | P25100 | 2/20 | 0.36 |
| ▸ | ADRA1A | P35348 | 2/20 | 0.36 |
| ▸ | ADRA1B | P35368 | 2/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.35 |
| ▸ | HTR2A | P28223 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31511847 | 0.72 | MAOA (0.42) | IDO1AGXTTSHRMAOASMN1; SMN2 | |
| SCHEMBL31511846 | 0.72 | MAOA (0.42) | IDO1AGXTTSHRMAOASMN1; SMN2 | |
| SCHEMBL28012339 | 0.72 | TSHR (0.46) | IDO1AGXTTSHRMAPTL3MBTL1 | |
| SCHEMBL978520 | 0.72 | CA12 (0.38) | — | |
| SCHEMBL435008 | 0.72 | KIF11 (0.37) | TSHRMAOASIGMAR1MAPTMC4R | |
| SCHEMBL8100608 | 0.71 | TSHR (0.44) | IDO1AGXTTSHRMAPTMAOB | |
| SCHEMBL6239315 | 0.70 | TSHR (0.50) | IDO1TSHRSIGMAR1SMN1; SMN2GAA | |
| SCHEMBL8523014 | 0.70 | SIGMAR1 (0.41) | MAOASIGMAR1SMN1; SMN2L3MBTL1CYP2A6 | |
| SCHEMBL9930083 | 0.69 | TSHR (0.52) | IDO1AGXTTSHRMAPTMAOB | |
| SCHEMBL2844263 | 0.69 | TSHR (0.52) | IDO1AGXTTSHRMAPTMAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4442782-A1 | METHOD FOR ACCELERATING CURING OF MONOMER AND INSTANT ADHESIVE KIT | ThreeBond Co., Ltd. (JP) | 2024-10-09 | — | — | EP | disclosed |
| US-20240318041-A1 | METHOD FOR ACCELERATING CURING OF MONOMER AND INSTANT ADHESIVE KIT | THREEBOND CO., LTD. (JP) | 2024-09-26 | — | — | US | disclosed |
| CN-118684800-A | Use of a composition for promoting the curing of monomers and instant adhesive kit | 三键有限公司 | 2024-09-24 | — | — | CN | disclosed |
| US-8658346-B2 | Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-25 | — | — | US | disclosed |
| US-8426105-B2 | Resist-modifying composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-8367310-B2 | Pattern forming process and resist-modifying composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-8329384-B2 | Resist-modifying composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-11 | — | — | US | disclosed |
| US-20110033799-A1 | PATTERN FORMING PROCESS, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST-MODIFYING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20100297554-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100297563-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20070281232-A1 | TONER, ELECTROPHOTOGRAPHIC APPARATUS AND PROCESS CARTRIDGE | CANON KABUSHIKI KAISHA (JP) | 2007-12-06 | — | — | US | disclosed |
| US-7202019-B2 | Photothermographic imaging material | KONICA MINOLTA HOLDINGS, INC. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-20060193796-A1 | Method for refining ultraviolet absorbent, ultraviolet absorbent and cosmetic material | NISSHIN OILLIO GROUP, LTD., THE (JP) | 2006-08-31 | — | — | US | disclosed |
| EP-1605027-A1 | METHOD FOR REFINING ULTRAVIOLET ABSORBENT, ULTRAVIOLET ABSORBENT AND COSMETIC MATERIAL | THE NISSHIN OIL MILLS, LTD. (JP) | 2005-12-14 | — | — | EP | disclosed |
| WO-1998045368-A1 | OLEFIN (CO-)POLYMER COMPOSITIONS AND METHOD OF PRODUCING THE SAME | CHISSO CORPORATION (JP) | 1998-10-15 | — | — | WO | disclosed |
| US-5622784-A | WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM | SEIKO EPSON CORPORATION (JP) | 1997-04-22 | — | — | US | disclosed |
| EP-0564004-B1 | A highly stereoregular polypropylene | CHISSO CORP (JP) | 1996-09-25 | — | — | EP | disclosed |
| EP-0564004-A1 | A highly stereoregular polypropylene | CHISSO CORPORATION (JP) | 1993-10-06 | — | — | EP | disclosed |
| US-5077341-A | Using coordination catalyst | CHISSO CORPORATION (JP) | 1991-12-31 | — | — | US | disclosed |
| EP-0404519-A2 | A process for producing a high-stiffness polypropylene | CHISSO CORPORATION (JP) | 1990-12-27 | — | — | EP | disclosed |