Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADORA3 | P0DMS8 | 4/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | HSD17B1 | P14061 | 3/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | XDH | P47989 | 1/20 | 0.44 |
| ▸ | BRD4 | O60885 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.39 |
| ▸ | RAB9A | P51151 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 3/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | KIF11 | P52732 | 1/20 | 0.38 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.38 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.38 |
| ▸ | PIK3CB | P42338 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9015250 | 0.84 | ALDH1A1 (0.36) | ADORA3MAPTSMN1; SMN2KMT2AKDM4E | |
| SCHEMBL1936088 | 0.84 | TSHR (0.44) | SMN1; SMN2KMT2AKDM4ERAB9AMEN1 | |
| SCHEMBL8412982 | 0.82 | NPC1 (0.38) | ADORA3MAPTKMT2AKDM4ERAB9A | |
| SCHEMBL9336288 | 0.82 | MEN1 (0.33) | ADORA3MAPTSMN1; SMN2KMT2AKDM4E | |
| SCHEMBL12952337 | 0.81 | PLK1 (0.51) | MAPTSMN1; SMN2KMT2ARAB9AMEN1 | |
| SCHEMBL7746430 | 0.81 | MAPT (0.47) | MAPTSMN1; SMN2KMT2AKDM4ERAB9A | |
| SCHEMBL23691953 | 0.80 | MAPT (0.60) | ADORA3MAPTHSD17B1SMN1; SMN2XDH | |
| SCHEMBL13222378 | 0.80 | HSD17B10 (0.50) | ADORA3MAPTSMN1; SMN2KMT2AKDM4E | |
| SCHEMBL14010605 | 0.80 | KDM4C (0.42) | MAPTSMN1; SMN2KMT2AKDM4EMEN1 | |
| SCHEMBL14036433 | 0.79 | CASP3 (0.36) | MAPTSMN1; SMN2KMT2AKDM4ERAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 153 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0592790-B1 | Negative photoresist composition | SUMITOMO CHEMICAL CO (JP) | 1998-03-11 | — | — | EP | claimed |
| EP-0592790-A1 | Negative photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-04-20 | — | — | EP | claimed |
| EP-2006738-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2017-09-06 | — | — | EP | disclosed |
| US-9032876-B2 | Lithographic printing plate precursor, lithographic printing plate platemaking method, and polymerizable monomer | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-8714088-B2 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORPORATION (JP) | 2014-05-06 | — | — | US | disclosed |
| EP-2343195-B1 | LITHOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE, AND POLYMERIZABLE MONOMER | FUJIFILM CORP (JP) | 2014-01-29 | — | — | EP | disclosed |
| US-8426102-B2 | Lithographic printing plate precursor and plate making method | FUJIFILM CORPORATION (JP) | 2013-04-23 | — | — | US | disclosed |
| US-8361700-B2 | Lithographic printing plate precursor and method of preparing lithographic printing plate | FUJIFILM CORPORATION (JP) | 2013-01-29 | — | — | US | disclosed |
| US-8361700-B2 | Lithographic printing plate precursor and method of preparing lithographic printing plate | FUJIFILM CORPORATION (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20120295204-A1 | PROCESSING METHOD OF LITHOGRAPHIC PRINTING PLATE PREURSOR | FUJIFILM CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120295204-A1 | PROCESSING METHOD OF LITHOGRAPHIC PRINTING PLATE PREURSOR | FUJIFILM CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| EP-0497342-B1 | Negative photoresist composition | SUMITOMO CHEMICAL CO (JP) | 1998-08-05 | — | — | EP | disclosed |
| EP-0592790-B1 | Negative photoresist composition | SUMITOMO CHEMICAL CO (JP) | 1998-03-11 | — | — | EP | disclosed |
| EP-0588092-B1 | Negtive photoresist composition | SUMITOMO CHEMICAL CO (JP) | 1996-03-27 | — | — | EP | disclosed |
| EP-0628599-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1994-12-14 | — | — | EP | disclosed |
| EP-0592790-A1 | Negative photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-04-20 | — | — | EP | disclosed |
| US-5304456-A | Negative photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-04-19 | — | — | US | disclosed |
| EP-0588092-A2 | Negtive photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-03-23 | — | — | EP | disclosed |
| EP-0497342-A2 | Negative photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-08-05 | — | — | EP | disclosed |
| US-4810618-A | HIGH SENSITIVITY, PRINTING PLATES, PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1989-03-07 | — | — | US | disclosed |