Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | OPRM1 | P35372 | 3/20 | 0.32 |
| ▸ | OPRD1 | P41143 | 3/20 | 0.32 |
| ▸ | OPRK1 | P41145 | 3/20 | 0.32 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13925835 | 1.00 | KDM4E (0.33) | KDM4ECYP19A1OPRM1OPRD1OPRK1 | |
| SCHEMBL14649899 | 1.00 | KDM4E (0.33) | KDM4ECYP19A1OPRM1OPRD1OPRK1 | |
| SCHEMBL2611791 | 0.98 | OPRM1 (0.33) | KDM4ECYP19A1OPRM1OPRD1OPRK1 | |
| SCHEMBL12011319 | 0.87 | KDM4E (0.32) | KDM4E | |
| SCHEMBL10222878 | 0.85 | NAAA (0.32) | KDM4ECYP2C19ALDH1A1 | |
| SCHEMBL11990295 | 0.84 | NAAA (0.37) | KDM4E | |
| SCHEMBL4171360 | 0.84 | KDM4E (0.31) | KDM4ECYP19A1OPRM1OPRD1OPRK1 | |
| SCHEMBL7080628 | 0.84 | USP2 (0.37) | KDM4ECYP19A1OPRM1OPRD1OPRK1 | |
| SCHEMBL12197285 | 0.84 | ALDH1A1 (0.41) | KDM4ECYP19A1FFAR3LMNAALDH1A1 | |
| SCHEMBL10186725 | 0.84 | KDM4E (0.31) | KDM4ECYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11920104-B2 | Ethers and esters of 1-substituted cycloalkanols for use as aroma chemicals | BASF SE (DE) | 2024-03-05 | — | — | US | disclosed |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| US-11248086-B2 | Hard-mask forming composition and method for manufacturing electronic component | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-02-15 | — | — | US | disclosed |
| US-20210340461-A1 | ETHERS AND ESTERS OF 1-SUBSTITUTED CYCLOALKANOLS FOR USE AS AROMA CHEMICALS | BASF SE (DE) | 2021-11-04 | — | — | US | disclosed |
| US-20210340461-A1 | ETHERS AND ESTERS OF 1-SUBSTITUTED CYCLOALKANOLS FOR USE AS AROMA CHEMICALS | BASF SE (DE) | 2021-11-04 | — | — | US | disclosed |
| CN-112867704-A | Ethers and esters of 1-substituted cycloalkanols as fragrance chemicals | 巴斯夫欧洲公司 | 2021-05-28 | — | — | CN | disclosed |
| WO-2020079007-A1 | ETHERS AND ESTERS OF 1-SUBSTITUTED CYCLOALKANOLS FOR USE AS AROMA CHEMICALS | BASF SE (DE) | 2020-04-23 | — | — | WO | disclosed |
| EP-3640234-A1 | ETHERS AND ESTERS OF 1-SUBSTITUTED CYCLOALKANOLS FOR USE AS AROMA CHEMICALS | BASF SE (DE) | 2020-04-22 | — | — | EP | disclosed |
| US-9557651-B2 | Chemically amplified positive-type photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-01-31 | — | — | US | disclosed |
| US-20150268553-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-24 | — | — | US | disclosed |
| US-8507180-B2 | Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-13 | — | — | US | disclosed |
| WO-2013047902-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | WO | disclosed |
| WO-2013018524-A1 | PHOTOSENSITIVE RESIN COMPOSITION, MATERIAL FOR FORMING RELIEF PATTERN, PHOTOSENSITIVE FILM, POLYIMIDE FILM, CURED RELIEF PATTERN AND METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE | 富士フイルム株式会社 (JP) | 2013-02-07 | — | — | WO | disclosed |
| US-20120251946-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20110300482-A1 | SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION | SAN-APRO, LTD (JP) | 2011-12-08 | — | — | US | disclosed |
| US-20100190107-A1 | CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION | IDEMITSU KOSAN CO. LTD (JP) | 2010-07-29 | — | — | US | disclosed |
| WO-2010067905-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |
| WO-2010067898-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |
| US-20100047715-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM, CHEMICALLY AMPLIFIED DRY FILM FOR THICK FILM, AND METHOD FOR PRODUCTION OF THICK FILM RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20090123838-A1 | CATHODE SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100190107-A1 | CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION | CRY1, PCNA, ERCC4 | KDM4E 3997/4885CYP19A1 803/4885OPRM1 2554/4885 |
| US-20230194983-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | RER1, TERB1, TRRAP | KDM4E 1921/4885CYP19A1 3302/4885OPRM1 4093/4885 |
| US-20110300482-A1 | SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION | ASIC1, H1-0, IK | KDM4E 960/4885CYP19A1 3774/4885OPRM1 564/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.