Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGKA | P23743 | 1/20 | 0.48 |
| ▸ | NAAA | Q02083 | 1/20 | 0.44 |
| ▸ | HTR2C | P28335 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.39 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.39 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.39 |
| ▸ | RAD52 | P43351 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.38 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 3/20 | 0.37 |
| ▸ | FAAH | O00519 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL332926 | 0.94 | NAAA (0.47) | DGKANAAAHTR2CALDH1A1MAPT | |
| SCHEMBL9185977 | 0.92 | NAAA (0.50) | DGKANAAAHTR2CALDH1A1MAPT | |
| SCHEMBL332710 | 0.92 | NAAA (0.50) | DGKANAAAHTR2CALDH1A1MAPT | |
| SCHEMBL11071867 | 0.92 | NAAA (0.50) | DGKANAAAHTR2CALDH1A1MAPT | |
| SCHEMBL17511723 | 0.92 | NAAA (0.50) | DGKANAAAHTR2CALDH1A1MAPT | |
| SCHEMBL27750415 | 0.92 | NAAA (0.50) | DGKANAAAHTR2CALDH1A1MAPT | |
| SCHEMBL20377189 | 0.90 | DGKA (0.57) | DGKANAAAHTR2CALDH1A1MAPT | |
| SCHEMBL10654547 | 0.90 | ADRA2A (0.46) | DGKANAAAHTR2CMAPTTDP1 | |
| SCHEMBL8419689 | 0.89 | DGKA (0.66) | DGKANAAAHTR2CALDH1A1MAPT | |
| SCHEMBL322130 | 0.88 | DGKA (0.52) | DGKAALDH1A1MAPTDNM1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110981873-B | Preparation method for synthesizing pyrroloquinoline quinone by five-step method | 江西农业大学 | 2025-01-24 | — | — | CN | claimed |
| CN-110981873-B | Preparation method for synthesizing pyrroloquinoline quinone by five-step method | 江西农业大学 | 2025-01-24 | — | — | CN | disclosed |
| EP-3839028-B1 | CLEANING PRODUCT | PROCTER & GAMBLE (US) | 2025-01-15 | — | — | EP | disclosed |
| EP-4386075-A2 | CLEANING PRODUCT | The Procter & Gamble Company (US) | 2024-06-19 | — | — | EP | disclosed |
| US-11834629-B2 | Cleaning product | THE PROCTER & GAMBLE COMPANY (US) | 2023-12-05 | — | — | US | disclosed |
| US-11834627-B2 | Cleaning product | THE PROCTER & GAMBLE COMPANY (US) | 2023-12-05 | — | — | US | disclosed |
| EP-4124651-B1 | CLEANING PRODUCT | PROCTER & GAMBLE (US) | 2023-11-29 | — | — | EP | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-11753604-B2 | Cleaning product | THE PROCTER & GAMBLE COMPANY (US) | 2023-09-12 | — | — | US | disclosed |
| US-20160062234-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20150241769-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-08-27 | — | — | US | disclosed |
| US-20150212407-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-07-30 | — | — | US | disclosed |
| US-20150212408-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-07-30 | — | — | US | disclosed |
| US-8450319-B2 | Pyrrolopyridazinone compound | UBE INDUSTRIES, LTD. (JP) | 2013-05-28 | — | — | US | disclosed |
| EP-1982986-B1 | PYRROLOPYRIDAZINONE COMPOUND AS PDE4 INHIBITOR | UBE INDUSTRIES (JP) | 2012-03-07 | — | — | EP | disclosed |
| US-20090036453-A1 | Pyrrolopyridazinone Compound | UBE INDUSTRIES, LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| EP-1982986-A1 | PYRROLOPYRIDAZINONE COMPOUND | Ube Industries, Ltd. (JP) | 2008-10-22 | — | — | EP | disclosed |
| US-7157062-B2 | Inhibition of the depletion of metal values from pregnant lixiviant solutions | GE BETZ, INC. (US) | 2007-01-02 | — | — | US | disclosed |
| US-20030228245-A1 | Inhibition of the depletion of metal values from pregnant lixiviant solutions | GE BETZ, INC. (US) | 2003-12-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150241769-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | PSMB10, PUF60, RARA | DGKA 1535/4885NAAA 942/4885HTR2C 4232/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | DGKA 3584/4885NAAA 2282/4885HTR2C 2945/4885 |
| US-20090036453-A1 | Pyrrolopyridazinone Compound | CBR3, CBR1, CYC1 | DGKA 3277/4885NAAA 2716/4885HTR2C 87/4885 |
| US-20150212407-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | HAX1, XBP1, AP1S1 | DGKA 2891/4885NAAA 4504/4885HTR2C 2103/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.