Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Adamantane SCHEMBL21924976 | 0.86 | TDP1 (0.38) | HSD11B1MAPTCYP2C9EPHX2L3MBTL1 | |
| Adamantane SCHEMBL22115918 | 0.86 | TDP1 (0.38) | HSD11B1MAPTCYP2C9EPHX2L3MBTL1 | |
| Adamantane SCHEMBL131439 | 0.86 | TDP1 (0.38) | HSD11B1MAPTCYP2C9EPHX2L3MBTL1 | |
| Adamantan-2-Ol SCHEMBL5405211 | 0.83 | CYP2C9 (0.56) | HSD11B1MAPTCYP2C9EPHX2L3MBTL1 | |
| Methacrylic Acid SCHEMBL6865018 | 0.81 | HSD11B1 (0.38) | HSD11B1MAPTCYP2C9EPHX2L3MBTL1 | |
| Acrylic Acid SCHEMBL27529960 | 0.78 | LMNA (0.43) | HSD11B1MAPTCYP2C9EPHX2L3MBTL1 | |
| Methacrylic Acid SCHEMBL3906229 | 0.78 | HSD11B1 (0.48) | HSD11B1MAPTCYP2C9EPHX2L3MBTL1 | |
| Methacrylic Acid SCHEMBL27806190 | 0.78 | EPHX1 (0.37) | HSD11B1MAPTCYP2C9EPHX2L3MBTL1 | |
| Methacrylic Acid SCHEMBL479571 | 0.77 | TDP1 (0.35) | HSD11B1 | |
| Methacrylic Acid SCHEMBL4167447 | 0.77 | TDP1 (0.35) | HSD11B1CYP2C9EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114044843-A | Photoresist resin and preparation method and application thereof | 宁波南大光电材料有限公司 | 2022-02-15 | — | — | CN | claimed |
| CN-103592717-B | Light guide plate, light emitting unit and liquid crystal display element having the same | CHI MEI CORP. (CN) | 2015-10-28 | — | — | CN | claimed |
| CN-118240132-A | Post-treatment method and application of photoresist resin | 徐州博康信息化学品有限公司 | 2024-06-25 | — | — | CN | disclosed |
| CN-114044843-A | Photoresist resin and preparation method and application thereof | 宁波南大光电材料有限公司 | 2022-02-15 | — | — | CN | disclosed |
| CN-110734520-B | ArF photoresist resin with high adhesiveness and preparation method thereof | 宁波南大光电材料有限公司 | 2021-11-26 | — | — | CN | disclosed |
| CN-108659223-B | Cyclodextrin derivative type photosensitive resin, preparation method thereof, resist composition based on cyclodextrin derivative type photosensitive resin and application of resist composition | 中科院广州化学有限公司南雄材料生产基地 | 2020-12-04 | — | — | CN | disclosed |
| CN-110734520-A | ArF photoresist resin with high adhesiveness and preparation method thereof | 宁波南大光电材料有限公司 | 2020-01-31 | — | — | CN | disclosed |
| CN-107848947-A | Fluorochemical, living polymerization initiator, fluoropolymer, the manufacture method of fluoropolymer and anti-corrosion agent composition | DIC株式会社 | 2018-03-27 | — | — | CN | disclosed |
| CN-104007623-B | The chemical reinforced slushing compound of positive tone organic solvent imaging | 国际商业机器公司 | 2017-06-16 | — | — | CN | disclosed |
| CN-106796373-A | Cured film is formed with composition, orientation material and phase difference material | 日产化学工业株式会社 | 2017-05-31 | — | — | CN | disclosed |
| CN-103025835-B | The compositions of coating on photoetching agent pattern | 默克专利有限公司 | 2016-06-29 | — | — | CN | disclosed |
| EP-1319981-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-06-18 | — | — | EP | disclosed |
| EP-1296190-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-26 | — | — | EP | disclosed |
| US-20030003391-A1 | High resolution photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2003-01-02 | — | — | US | disclosed |
| US-20020102491-A1 | Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) | FUJI PHOTO FILM CO., LTD. | 2002-08-01 | — | — | US | disclosed |
| EP-1199603-A9 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-31 | — | — | EP | disclosed |
| US-6410204-B1 | CONTAINING ACID GENERATOR | FUJI PHOTO FILM CO., LTD. (JP) | 2002-06-25 | — | — | US | disclosed |
| US-20020061464-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-23 | — | — | US | disclosed |
| EP-1199603-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-24 | — | — | EP | disclosed |
| EP-1122607-A1 | High resolution photoresist compositions | Shipley Company LLC (US) | 2001-08-08 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020102491-A1 | Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) | RARA, ARSA, RARB | HSD11B1 2555/4885MAPT 1592/4885CYP2C9 4681/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.