SCHEMBL825488

SCHEMBL825488

CCC(C)c1ccc(OCOc2cc3ccccc3cc2O)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.47
TSHR P16473 2/20 0.47
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
TDP1 Q9NUW8 1/20 0.40
GAA P10253 2/20 0.40
USP2 O75604 1/20 0.40
PKM P14618 1/20 0.40
HPGD P15428 1/20 0.40
ALOX15 P16050 1/20 0.40
HSD17B10 Q99714 1/20 0.40
TP53 P04637 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
NPC1 O15118 3/20 0.39
RAB9A P51151 3/20 0.39
HDAC4 P56524 1/20 0.38
HDAC2 Q92769 1/20 0.38
HDAC8 Q9BY41 1/20 0.38
HSP90AA1 P07900 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683034 0.85 ALDH1A1 (0.44) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL825353 0.81 ALDH1A1 (0.49) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL825531 0.80 KCNA3 (0.47) ALDH1A1TSHRHSD17B10TP53SMN1; SMN2
SCHEMBL825494 0.79 ALDH1A1 (0.60) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL825545 0.79 ALDH1A1 (0.45) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL11113379 0.79 ALDH1A1 (0.62) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL825489 0.77 ALDH1A1 (0.48) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL825406 0.77 ALDH1A1 (0.48) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL825567 0.75 ALDH1A1 (0.55) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL14118678 0.74 MAPT (0.54) ALDH1A1TSHRMEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed