SCHEMBL13683043

SCHEMBL13683043

CCC(C)(C)C(=O)OCCOCOc1cccc(O)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 2/20 0.43
CHRNA4 P43681 2/20 0.43
KDM4E B2RXH2 2/20 0.41
CYP3A4 P08684 1/20 0.40
CNR1 P21554 2/20 0.38
CNR2 P34972 2/20 0.38
TDP1 Q9NUW8 3/20 0.37
L3MBTL1 Q9Y468 3/20 0.37
CHRNB4 P30926 1/20 0.37
CHRNA3 P32297 1/20 0.37
MTNR1A P48039 2/20 0.37
MTNR1B P49286 2/20 0.37
APP P05067 1/20 0.37
TSHR P16473 2/20 0.36
MAPK1 P28482 2/20 0.36
ALDH1A1 P00352 1/20 0.36
KMT2A Q03164 1/20 0.36
DRD2 P14416 1/20 0.36
DRD4 P21917 1/20 0.36
ADRA1D P25100 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683039 0.89 L3MBTL1 (0.50) KDM4ETDP1L3MBTL1MAPK1KMT2A
SCHEMBL13683041 0.88 TDP1 (0.44) KDM4ETDP1MTNR1AMTNR1BTSHR
SCHEMBL13683046 0.87 CHRM2 (0.41) TSHRMAPK1ALDH1A1
SCHEMBL13683056 0.86 HDAC1 (0.46) KDM4E
SCHEMBL13683049 0.86 CYP3A4 (0.43) KDM4ECYP3A4TDP1L3MBTL1MTNR1A
SCHEMBL13683066 0.84 PPARG (0.47) KDM4ETDP1MAPK1ALDH1A1KMT2A
SCHEMBL13683037 0.81 MEN1 (0.47) CYP3A4L3MBTL1TSHRALDH1A1KMT2A
SCHEMBL13683058 0.81 NPC1 (0.46)
SCHEMBL18219828 0.80 KDM4E (0.48) KDM4ETDP1TSHRALDH1A1KMT2A
SCHEMBL11306567 0.80 KDM4E (0.48) KDM4ETDP1TSHRALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed