Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 11/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | PPARG | P37231 | 3/20 | 0.35 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.33 |
| ▸ | PTGES | O14684 | 1/20 | 0.33 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.33 |
| ▸ | C5AR1 | P21730 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.32 |
| ▸ | HTR4 | Q13639 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14220824 | 0.90 | HPGD (0.38) | HPGD | |
| SCHEMBL10138859 | 0.84 | LMNA (0.43) | HPGDLMNAHTTSMN1; SMN2PPARG | |
| SCHEMBL14220826 | 0.80 | HPGD (0.39) | HPGDLMNAHTTSMN1; SMN2PPARG | |
| SCHEMBL14219813 | 0.75 | PPARG (0.36) | LMNAHTTSMN1; SMN2PPARGALDH1A1 | |
| SCHEMBL10088186 | 0.74 | NR3C1 (0.38) | HPGDLMNAPPARGALDH1A1 | |
| SCHEMBL13359730 | 0.74 | HPGD (0.42) | HPGD | |
| SCHEMBL14219881 | 0.72 | NFE2L2 (0.35) | HPGDSMN1; SMN2PPARGPTGESALOX5 | |
| SCHEMBL10148404 | 0.72 | HPGD (0.36) | HPGDLMNAHTTSMN1; SMN2PPARG | |
| SCHEMBL22681155 | 0.70 | L3MBTL1 (0.39) | HPGDLMNAHTTSMN1; SMN2PPARG | |
| SCHEMBL14219830 | 0.70 | HPGD (0.37) | HPGDACHEALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1906248-A1 | Resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-04-02 | — | — | EP | disclosed |