SCHEMBL14620106

SCHEMBL14620106

Cc1nc2ccccc2c(=O)n1OS(=O)(=O)c1ccc(Cl)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.51
ALDH3A1 P30838 1/20 0.48
CYP1A2 P05177 4/20 0.46
MAPT P10636 3/20 0.46
CYP2C9 P11712 3/20 0.46
CYP2C19 P33261 3/20 0.46
CYP2D6 P10635 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
SMN1; SMN2 Q16637 4/20 0.46
KDM4E B2RXH2 2/20 0.46
POLB P06746 1/20 0.46
TDP1 Q9NUW8 2/20 0.44
LMNA P02545 2/20 0.44
ALOX15 P16050 1/20 0.44
TSHR P16473 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
CYP3A4 P08684 2/20 0.43
MEN1 O00255 1/20 0.43
TP53 P04637 1/20 0.43
PKM P14618 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7533236 0.91 KDM4E (0.51) KMT2ACYP1A2CYP2C9CYP2C19SMN1; SMN2
SCHEMBL7528390 0.90 VDR (0.49) ALDH3A1CYP1A2MAPTSMN1; SMN2KDM4E
SCHEMBL14620219 0.86 SMN1; SMN2 (0.54) KMT2ACYP1A2MAPTCYP2C9CYP2C19
SCHEMBL14620107 0.78 KDM4E (0.51) KMT2ACYP1A2CYP2C9CYP2C19CYP2D6
SCHEMBL7534483 0.78 SMN1; SMN2 (0.53) KMT2AMAPTNPSR1SMN1; SMN2KDM4E
SCHEMBL7531474 0.76 L3MBTL1 (0.50) KMT2ACYP1A2CYP2C9CYP2C19SMN1; SMN2
SCHEMBL9811319 0.76 KMT2A (0.52) KMT2AMAPTSMN1; SMN2KDM4EPOLB
SCHEMBL14588661 0.76 CYP1A2 (0.66) KMT2ACYP1A2MAPTCYP2C9CYP2C19
SCHEMBL9013659 0.75 KDM4E (0.49) CYP1A2NPSR1SMN1; SMN2KDM4EPOLB
SCHEMBL4836742 0.73 ALDH1A1 (0.46) KMT2ACYP2C9CYP2C19CYP2D6NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7157205-B2 Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed