SCHEMBL7531474

SCHEMBL7531474

Cc1nc2ccccc2c(=O)n1OS(=O)(=O)C(F)(F)F

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 3/20 0.50
ALDH1A1 P00352 3/20 0.50
KDM4E B2RXH2 1/20 0.50
GLA P06280 1/20 0.46
CYP1A2 P05177 2/20 0.46
LMNA P02545 1/20 0.46
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
TP53 P04637 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.43
TSHR P16473 1/20 0.43
GAA P10253 1/20 0.43
ALOX15 P16050 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7533236 0.82 KDM4E (0.51) L3MBTL1ALDH1A1KDM4EGLACYP1A2
SCHEMBL14620107 0.82 KDM4E (0.51) L3MBTL1ALDH1A1KDM4ECYP1A2LMNA
SCHEMBL9013659 0.80 KDM4E (0.49) L3MBTL1ALDH1A1KDM4EGLACYP1A2
SCHEMBL17130614 0.79 MAPK1 (0.41) L3MBTL1ALDH1A1KDM4ELMNAMEN1
SCHEMBL7528390 0.78 VDR (0.49) L3MBTL1ALDH1A1KDM4ECYP1A2LMNA
SCHEMBL14620106 0.76 KMT2A (0.51) L3MBTL1ALDH1A1KDM4ECYP1A2LMNA
SCHEMBL17130846 0.74 ALPL (0.33) ALDH1A1KDM4ECYP1A2CYP2C9CYP2C19
SCHEMBL27370760 0.74 ALDH1A1 (0.66) L3MBTL1ALDH1A1KDM4ECYP1A2LMNA
SCHEMBL17130843 0.73 TDP1 (0.35) L3MBTL1ALDH1A1KDM4ECYP1A2CYP2C9
SCHEMBL13319273 0.71 MEN1 (0.56) L3MBTL1ALDH1A1KDM4ECYP1A2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0801329-B1 RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM PRODUCED THEREFROM CLARIANT FINANCE BVI LTD (VG) 2002-03-27 EP disclosed
US-6110639-A Radiation-sensitive composition and recording medium using the same HOECHST JAPAN LIMITED (JP) 2000-08-29 US disclosed
EP-0801329-A1 RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM PRODUCED THEREFROM HOECHST JAPAN LIMITED (JP) 1997-10-15 EP disclosed